사람발생과정에 있어서 염색체이상과 genomic imprinting과의 관계 2)포도상기태에서 H19과 IGF2유전자의 독자적인 발현

장성익,최보화,이태성,김대광,이인환 대한해부학회 1998 Anatomy & Cell Biology Vol.31 No.4

Detection of Imprinted Quantitative Trait Loci (QTL) for Growth Traits in Pigs

Lee, H.K.,Lee, S.S.,Kim, T.H.,Jeon, G.J.,Jung, H.W.,Shin, Y.S.,Han, J.Y.,Choi, B.H.,Cheong, I.C. Asian Australasian Association of Animal Productio 2003 Animal Bioscience Vol.16 No.8

As an experimental reference population, crosses between Korean native pig and Landraces were established and information on growth traits was recorded. Animals were genotyped for 24 microsatellite markers covering chromosomes 2, 6, and 7 for partial-genome scan to identify chromosomal regions that have effects on growth traits. quantitative trait loci (QTL) effects were estimated using interval mapping by the regression method under the line cross models with a test for imprinting effects. For test of presence of QTL, chromosome-wide and single position significance thresholds were estimated by permutation test and normal significance threshold for the imprinting test were derived. For tests against the Mendelian model, additive and dominance coefficients were permuted within individuals. Thresholds (5% chromosome-wide) against the no-QTL model for the analyzed traits ranged from 4.57 to 4.99 for the Mendelian model and from 4.14 to 4.67 for the imprinting model, respectively. Partial-genome scan revealed significant evidence for 4 QTL affecting growth traits, and 2 out of the 4 QTLs were imprinted. This study demonstrated that testing for imprinting should become a standard procedure to unravel the genetic control of multi-factorial traits. The models and tests developed in this study allowed the detection and evaluation of imprinted QTL.

Fabrication of an All-Layer-Printed TFT-LCD Device via Large-Area UV Imprinting Lithography

Lee, Seung-Jun,Park, Dae-Jin,Bae, Joo-Han,Lee, Sung-Hee,Kim, Jang-Kyum,Kim, Kyu-Young,Bae, Jung-Mok,Kim, Bo-Sung,Kim, Soon-Kwon,Lee, Su-Kwon,Kwon, Sin,Seo, Jung-Woo,Kim, Ki-Hyun,Cho, Jung-Wok,Chang, J The Korean Infomation Display Society 2010 Journal of information display Vol.11 No.2

Nanoimprint lithography (NIL) using ultraviolet (UV) rays is a technique in which unconventional lithographic patterns are formed on a substrate by curing a suitable liquid resist in contact with a transparent patterned mold, then releasing the freshly patterned material. Here, various solutions are introduced to achieve sufficient overlay accuracy and to overcome the technical challenges in resist patterning via UV imprinting. Moreover, resist patterning of all the layers in TFT and of the BM layer in CF was carried out using UV imprinting lithography to come up with a 12.1-inch TFT-LCD panel with a resolution of $1280{\times}800$ lines (125 ppi).

Fabrication of an All-Layer-Printed TFT-LCD Device via Large-Area UV Imprinting Lithography

이승준,박대진,이성희,김장겸,김규영,배정목,김보성,임순권,이석원,권신,서정우,김기현,조정우,장재혁 한국정보디스플레이학회 2010 Journal of information display Vol.11 No.2

Nanoimprint lithography (NIL) using ultraviolet (UV) rays is a technique in which unconventional lithographic patterns are formed on a substrate by curing a suitable liquid resist in contact with a transparent patterned mold, then releasing the freshly patterned material. Here, various solutions are introduced to achieve sufficient overlay accuracy and to overcome the technical challenges in resist patterning via UV imprinting. Moreover, resist patterning of all the layers in TFT and of the BM layer in CF was carried out using UV imprinting lithography to come up with a 12.1-inch TFT-LCD panel with a resolution of 1280x800 lines (125 ppi).

초음파 임프린팅에서 금형온도에 따른 미세패턴의 전사특성 연구

민경빈(Kyeong Bin Min),박종한(Jong Han Park),박창용(Chang Yong Park),박근(Keun Park) 대한기계학회 2014 大韓機械學會論文集A Vol.38 No.1

초음파 임프린팅은 열가소성 고분자 기판에 미세패턴을 복제할 수 있는 공정으로 타 성형방법에 비해 에너지소모가 적고 성형시간이 단축되는 장점이 있다. 초음파 임프린팅 공정에서는 고분자 기판의 표면에 초음파 진동에너지를 인가하여 소재간의 마찰열과 미세하게 반복되는 변형에너지의 축적을 통해 고분자 표면을 국부적으로 가소화시켜 미세패턴이 전사된다. 본 연구에서는 초음파 임프린팅에서 금형 온도가 미세패턴의 전사성에 미치는 영향을 분석하였다. 이를 위해 금형온도를 변화시켜가며 임프린팅을 수행하여 미세패턴 성형 영역에서의 온도변화를 관찰하였고, 상기 온도변화를 고려하여 미세패턴의 충진과정을 전산모사를 통해 고찰하였다. 또한 금형온도 변화에 따른 패턴의 전사율 및 전사균일도를 측정하여 비교하였다. 상기 결과를 통해 금형온도를 높일수록 초음파 임프린팅시 미세패턴의 전사특성이 향상됨을 확인할 수 있었다. Ultrasonic imprinting is a novel process for replicating micropatterns on thermoplastic polymer substrates with low energy consumption and short cycle time. The polymer substrate is softened by the frictional heat and repetitive deformation energy under ultrasonic excitation; thus, a number of micropatterns are replicated on the softened polymer substrate. In the present work, the effect of mold temperature on the replication characteristics of ultrasonic imprinting is investigated. The temperature change in the patterned region is measured by varying the mold temperature. Numerical simulation is then performed for investigating pattern replication characteristics under various mold temperatures. In addition, pattern replication ratio and uniformity are compared through various experimental measurements. Through the results of these comparisons, it is found that the mold temperature has a significant positive effect on the replication characteristics of ultrasonic imprinting.

Facile Multiscale Patterning by Creep-Assisted Sequential Imprinting and Fuel Cell Application

Jang, Segeun,Kim, Minhyoung,Kang, Yun Sik,Choi, Yong Whan,Kim, Sang Moon,Sung, Yung-Eun,Choi, Mansoo American Chemical Society 2016 ACS APPLIED MATERIALS & INTERFACES Vol.8 No.18

<P>The capability of fabricating multiscale structures with desired morphology and incorporating them into engineering applications is key to realizing technological breakthroughs by employing the benefits from both microscale and nanoscale morphology simultaneously. Here, we developed a facile patterning method to fabricate multiscale hierarchical structures by a novel approach called creep assisted sequential imprinting. In this work, nanopatterning was first carried out by thermal imprint lithography above the glass transition temperature (T-g) of a polymer film, and then followed by creep-assisted imprinting with micropattems based on the mechanical deformation of the polymer film under the relatively long-term exposure to mechanical stress at temperatures below the T-g of the polymer. The fabricated multiscale arrays exhibited excellent pattern uniformity over large areas. To demonstrate the usage of multiscale architectures, we incorporated the multiscale Nafion films into polymer electrolyte membrane fuel cell, and this device showed more than 10% higher performance than the conventional one. The enhancement was attributed to the decrease in mass transport resistance because of unique cone shape morphology by creep-recovery effects and the increase in interfacial surface area between Nafion film and electrocatalyst layer.</P>

초음파 임프린팅을 이용한 열가소성 고분자수지 미세패턴 복제기술

박근(Keun Park),이기연(Ki-Yeon Lee),정우신(Woosin Jung),서영수(Young-Soo Seo) 한국소성가공학회 2012 미세가공 심포지엄 Vol.2012 No.11

The present study concerns the micro-pattern replication on thermoplastic polymer using ultrasonic imprinting. The ultrasonic imprinting process uses ultrasonic vibration energy to generate frictional heat between an ultrasonic horn and the polymer film, from which the surface region of the polymer film is softened sufficiently for the replication of micro-patterns. Various applications of the ultrasonic imprinting are introduced in terms of the ways to improve replication characteristics. Firstly, the effects of tool design parameters as well as experimental conditions are discussed. The effect of the vibration transmission direction on the replication ratio is also investigated.

신경언어학 측면에서 본 제2언어학습

최종호 ( Jong Ho Choi ) 한국스페인어문학회 2016 스페인어문학 Vol.0 No.79

It is known that compared to the mother tongue or the first language, it is much more difficult to master a second language, especially when we learn it after puberty. More time and more effort is needed to learn it, but even so, we can not reach a ``perfect`` level as the mother tongue. To explain this difference, the so-called Critical Period Hypothesis assumes that to master a language we should learn it before the ‘critical period’ and that the brain areas in which language learning is done are different before and after the critical period. However, according to recent neurolinguistic studies, the time of language learning is not the only factor, but the fluency in a language, the proper method of language experience, etc. are also factors that can influence the brain area for languages. In this paper, we argue that to approach to the ‘perfect’ level of a language or to influence the brain area for language, the unconscious ‘imprinting’ of the target language is needed and that the above factors are those that enable this unconscious imprinting. We also propose some methods to facilitate this unconscious imprinting in foreign language learning environment in Korea.

Genomic Imprinting and Sex Determination Vollenhovia emeryi (Hymenoptera: Myrmicinae)

Pureum Noh,Jae Chun Choe,Gilsang Jeong 한국응용곤충학회 2012 한국응용곤충학회 학술대회논문집 Vol.2012 No.05

In haplodiploid sex determination, females are sexually reproduced from fertilized diploid eggs, and males from unfertilized haploid eggs. Haplodiploid sex determination seems simple in that sex depends simply on the ploid level. However, the underlying genetic mechanisms are thought to be much more complicated than expected. Among them, a powerful proposed mechanism is genomic imprinting. All epigenetic on-off systems require target genes, unless the systems target histone proteins on chromosomes. For Hymenoptera, a good candidate target gene in terms of sex determination is known either as feminizer (fem) or transformer (tra) in many insects. These two genes are essential for expressing femaleness. In most Hymenopteran insects, the maternal tra seems to be methylated and consequently not expressed, while the paternally derived tra gene is not methylated. Therefore, a fertilized egg with the paternally derived active tra gene will develop into a functional female. Like all Hymenoptera, ants (Formicidae) have haplodiploid sex determination. In Vollenhovia emeryi, however, queens are produced clonally while workers derive from fertilized eggs. Males are haploid, likewise deriving from fertilized eggs, but only after selective elimination of their maternal genome. Under the conventional genomic imprinting model, we would have expected that the opposite pattern of what is observed in others. Here we present extraordinary sex determination and suggest our hypothesis about genomic imprinting pattern in V. emeryi

Preparation of Molecularly Imprinted Polymers Using Photocross-linkable Polyphosphazene and Selective Rebinding of Amino Acids

이승철,장지영 한국고분자학회 2009 Macromolecular Research Vol.17 No.7

A photocrosslinkable polyphosphazene was used for molecular imprinting. We synthesized polyphosphazene (3) having urea groups for complexation with N-carbobenzyloxyglycin (Z-Gly-OH, template) and chalcone groups for cross-linking reaction. As substituents, 4-hydroxychalcone (1) and N-(4-hydroxyphenyl)-N'-ethylurea (2) were prepared. Choloro groups of poly(dichlorophosphazene) were replaced by the sequential treatment with sodium salts of compounds 1 and 2, and trifluoroethanol. The template molecule was complexed with the urea groups on the polymer chains via hydrogen bonding. A thin polymer film was prepared by casting a solution of the complex of polymer 3 and the template in dimethylformamide on a quartz cell and irradiated with 365 nm UV light to yield a cross-linked film with a thickness of about 16 μm. The template molecules in the film were removed by Soxhlet extraction with methanol/acetic acid. The control polymer film was prepared in the same manner for the preparation of the imprinted polymer film, except that the template and triethylamine were omitted. In the rebinding test, the imprinted film exhibited much higher recognition ability for the template than the control polymer. We also investigated the specific recognition ability of the imprinted polymer for the template and its structural analogues. The rebinding tests were conducted using Z-Glu-OH, Z-Asp(OtBu)-OH, and Z-Glu-OMe. The imprinted film showed higher specific recognition ability for the template and the lowest response for Z-Asp(OtBu)-OH.