Some characteristics of materials surface-modified by ions beam bombardment

Park, J.W.,Sohn, C.W.,Choi, B.H. Elsevier 2006 CURRENT APPLIED PHYSICS Vol.6 No.2

<P><B>Abstract</B></P><P>Ion implantations with energies less than 100keV and current densities of 10<SUP>15</SUP>–10<SUP>18</SUP>ions/cm<SUP>2</SUP> were conducted to polymers, metals, and diamond gemstone. Physical and chemical phenomena and mechanical properties of the implanted materials were investigated.</P><P>Single or mixed ions of N, He, C were implanted onto polyethylene terephtalate (PET) to see the surface hardening effects. Multiple ion-implantation resulted in more increase in the surface hardness than single ion implantation at the same ion energy and dose. Implantation of C+N ions increased the surface hardness by about three times as compared to implantation of N or C ions alone. XPS analysis showed that C–N compounds were formed when both N and C ions are implanted into PET, implying that hard particle formation by reactions between the implanted ions and/or between the implanted N ions and carbon in PET in addition to the cross linking may be the mechanism of this significant increase in hardness.</P><P>Ion implantation with 70keV N ions of >5×10<SUP>16</SUP>/cm<SUP>2</SUP> into the surface-polished stainless steel reduced the average surface roughness (<I>R</I><SUB>a</SUB>) from 0.04μm to 0.02μm. The implanted nitrogen was detected up to at least 300nm from the surface of the stainless steel as measured with Auger electron spectroscopy. X-ray photo-electron spectroscopy analysis showed that the implanted N formed mostly Cr<SUB>2</SUB>N without post irradiation annealing. Hardness depth profiles obtained with nano-indentation technique showed that the peak hardness of 14Gpa formed at ≈50nm depth from the N ion implanted surface was about at least 2 times higher than non-irradiated specimen.</P><P>N ions were implanted into the diamond in order to change the optical band gap and then to change the emitted color. In spite of the restricted ion penetrated depth, uniform and vividly changed color was observed after heat treatment of the nitrogen-implanted diamond in the vacuum or inert gas atmosphere. The changed color appeared to be black. Chemical states of the implanted nitrogen were N–N and 4N-vacancy as characterized with FTIR. Band structure calculation shows that band gap of the diamond reduced by 25% after N doping.</P>

Mg ion implantation on SLA-treated titanium surface and its effects on the behavior of mesenchymal stem cell

Kim, B.S.,Kim, J.S.,Park, Y.M.,Choi, B.Y.,Lee, J. Elsevier 2013 Materials science & engineering. C, Materials for Vol.33 No.3

Magnesium (Mg) is one of the most important ions associated with bone osseointegration. The aim of this study was to evaluate the cellular effects of Mg implantation in titanium (Ti) surfaces treated with sand blast using large grit and acid etching (SLA). Mg ions were implanted into the surface via vacuum arc source ion implantation. The surface morphology, chemical properties, and the amount of Mg ion release were evaluated by scanning electron microscopy (SEM), Auger electron spectroscopy (AES), Rutherford backscattering spectroscopy (RBS), and inductively coupled plasma-optical emission spectrometer (ICP-OES). Human mesenchymal stem cells (hMSCs) were used to evaluate cellular parameters such as proliferation, cytotoxicity, and adhesion morphology by MTS assay, live/dead assay, and SEM. Furthermore, osteoblast differentiation was determined on the basis of alkaline phosphatase (ALP) activity and the degree of calcium accumulation. In the Mg ion-implanted disk, 2.3x10<SUP>16</SUP>ions/cm<SUP>2</SUP> was retained. However, after Mg ion implantation, the surface morphology did not change. Implanted Mg ions were rapidly released during the first 7days in vitro. The MTS assay, live/dead assay, and SEM demonstrated increased cell attachment and growth on the Mg ion-implanted surface. In particular, Mg ion implantation increased the initial cell adhesion, and in an osteoblast differentiation assay, ALP activity and calcium accumulation. These findings suggest that Mg ion implantation using the plasma source ion implantation (PSII) technique may be useful for SLA-treated Ti dental implants to improve their osseointegration capacity.

Development and Utilization of a 300 keV Ion Implanter

Jae S. Lee,B. H. Choi,J. Y. Kim,Y. S. Cho 한국물리학회 2008 THE JOURNAL OF THE KOREAN PHYSICAL SOCIETY Vol.52 No.3

A 300 keV ion implanter has been designed and manufactured for studies of surface modification of several materials by using an ion beam. The purpose of design is domestic development of the basic technology for a high-energy ion implanter. The main point of the design is production, acceleration and transport of a high nitrogen ion beam current up to 5 mA and ion energy up to 300 keV. The 300 keV ion implanter consists of a Duo-PIGatron ion source, a mass separation magnet, a slit, a magnetic steerer, an acceleration tube, a magnetic quadrupole doublet, an electrostatic scanner and a target. The implanter control system includes fiber optics links for monitoring and controlling the ion source parameters in the high-voltage zone and computer system for the characterization of the ion beam and entire control of the implantation process. Also, this equipment will used for diverse applications, like optics, electronics, materials, medical science and so on, by modifying the surface characteristics of materials, such as polymers, metals and ceramics. A 300 keV ion implanter has been designed and manufactured for studies of surface modification of several materials by using an ion beam. The purpose of design is domestic development of the basic technology for a high-energy ion implanter. The main point of the design is production, acceleration and transport of a high nitrogen ion beam current up to 5 mA and ion energy up to 300 keV. The 300 keV ion implanter consists of a Duo-PIGatron ion source, a mass separation magnet, a slit, a magnetic steerer, an acceleration tube, a magnetic quadrupole doublet, an electrostatic scanner and a target. The implanter control system includes fiber optics links for monitoring and controlling the ion source parameters in the high-voltage zone and computer system for the characterization of the ion beam and entire control of the implantation process. Also, this equipment will used for diverse applications, like optics, electronics, materials, medical science and so on, by modifying the surface characteristics of materials, such as polymers, metals and ceramics.

금속 임플란트 소재의 내마모성 향상을 위하여 적용되는 질소 이온주입 및 이온도금법의 한계

김철생 대한의용생체공학회 2004 의공학회지 Vol.25 No.2

금속 임플란트 재료들의 마모저항을 향상시키기 위하여 질소 이온주입 및 이온도금 기술을 적용하였다. 질소 이온주입 된 초내식성 스테인리스강(S.S.S)의 마모이온용출 특성을 S.S.S, 316L SS, TiN코팅된 316S SS와 비교 평가하기 위하여 탄소로 원자흡수분광분석기를 이용하여 시편들로부터 마모용출된 Cr과 Ni 이온량을 측정하였다. 또한, 저온아크증착법을 이용하여 TiN, ZrN, TiCN코팅된 Ti(Grade 2)원반의 마모저항을 비교하였고, 질소이온주입 및 질화물 코팅된 표면충의 화학적 조성은 SAES(scanning Auger electron spectroscopy)를 이용하여 분석하였다. 질소 이온주입된 S.S.S 표면으로부터 마모에 의하여 용출된 Cr과 Ni 이온량은 표면처리하지 않은 스테인리스강들에 비하여 크게 감소하였다 그러나 인공고관절에 걸리는 하중조건 하에서 실행된 마모이온용출실험에서 이온에너지 100 KeV로 질소이온 주입된 표면층은 20만회 내에서 쉽게 제거되었다. 질화물 코팅된 Ti 시편들의 마모저항도 크게 향상되었고, 그 마모특성은 코팅층의 화학적 조성에 따라 크게 차이가 났다. 코팅두께 3Um의 코팅시편들 중 TiCN 코팅된 티타늄이 가장 높은 내마모 특성을 보였으나 같은 하중조건 하에서 disk(Ti)-on-disk 마모실험에서 그 질화물 코팅면들의 마모 무게감 소비는 1만회 아래에서 모두 Ti의 마모비와 유사하게 전환되었다. 본 실험으로부터 얻어진 연구결과에 의하면, 100 KeV 질소이온주입 및 두께 3$\mu\textrm{m}$의 길화코팅된 표면층의 경우 표면 경화충의 깊이가 충분치 않아 높은 하중을 받는 임플란트의 마찰부위에 사용하기에는 한계가 있음을 보였다. Nitrogen ion implantation and ion plating techniques were applied for improvement of the wear resistance of metallic implant materials. In this work, the wear dissolution behaviour of a nitrogen ion implanted super stainless steel (S.S.S, 22Cr-20Ni-6Mo-0.25N) was compared with those of S.S.S, 316L SS and TiN coated 316L SS. The amounts of Cr and Ni ions worn-out from the specimens were Investigated using an electrothermal atomic absorption spectrometry. Furthermore, the Ti(Grade 2) disks were coated with TiN, ZrN and TiCN by use of low temperature arc vapor deposition and the wear resistance of the coating layers was compared with that of titanium. The chemical compositions of the nitrogen ion implanted and nitride coated layers were examined with a scanting auger electron spectroscopy. It wat observed that the metal ions released from the nitrogen ion implanted S.S.S surface were significantly reduced. From the results obtained, it was shown that the nitrogen ion implanted zone obtained with 100 KeV ion energy was easily removed within 200,000 revolutions from a wear dissolution testing under a similar load condition when applied to artificial hip joint. The remarkable improvement in wear resistance weir confirmed by the nitrides coated Ti materials and the wear properties differ greatly according to the chemical composition of the coating layers. for specimens with the same coating thickness of about 3$\mu\textrm{m}$, TiCN coated Ti showed the highest wear resistance. However, after removing the coating layers, the wear rates of all nitrides coated Ti reverted to their normal rates of below 10,000 revolutions from Ti-disk-on-disk wear testing under the same load condition. From the results obtained, it is suggested that the insufficient depth of the 100 Kel N$\^$+/ ion implanted zone and of the nitrides coated layers of 3$\mu\textrm{m}$ are subject to restriction when used as frictional parts of load bearing implants.

반도체 제조 이온주입 공정의 이온 임플란타 장치에서 엑스레이 발생 특성

박동욱,조경이,김소연,이승희,정은교 한국산업보건학회 2023 한국산업보건학회지 Vol.33 No.4

Objectives: The aims of this study are to investigate how X-rays are emitted to surrounding parts during the ion implantation process, to analyze these emissions in relation to the properties of the ion implanter equipment, and to estimate the resulting exposure dose. Eight ion implanters equipped with high-voltage electrical systems were selected for this study. Methods: We monitored X-ray emissions at three locations outside of the ion implanters: the accelerator equipped with a high-voltage energy generator, the impurity ion source, and the beam line. We used a Personal Portable Dose Rate and Survey Meter to monitor real-time X-ray levels. The SX-2R probe, an X-ray Features probe designed for use with the Radiagem™ meter, was also utilized to monitor lower ranges of X-ray emissions. The counts per second (CPS) measured by the meter were estimated and then converted to a radiation dose (μSv/hr) based on a validated calibration graph between CPS and μGy/hr. Results: X-rays from seven ion implanters were consistently detected in high-voltage accelerator gaps, regardless of their proximity. X-rays specifically emanated from three ion implanters situated in the ion box gap and were also found in the beam lines of two ion implanters. The intensity of these X-rays did not show a clear pattern relative to the devices' age and electric properties, and notably, it decreased as the distance from the device increased. Conclusions: In conclusion, every gap, in which three components of the ion implanter devices were divided, was found to be insufficiently shielded against X-ray emissions, even though the exposure levels were not estimated to be higher than the threshold.

Cell Patterning on Polystyrene by Ion Implantation

Chan-Hee Jung,Jae-Hak Choi,Dong-Ki Kim,Hae-Kyoung Kim,Ho-Je Kwon,Young-Chang Nho,Youn-Mook Lim 한국물리학회 2008 THE JOURNAL OF THE KOREAN PHYSICAL SOCIETY Vol.52 No.3

A simple ion implantation process was successfully used for cell patterning. Polystyrene was implanted with 100 keV Ar ions through a mask. The surface properties of the ion-implanted polystyrene were characterized by using Fourier transform-infrared spectroscopy (FT-IR), water contact angle measurement, and X-ray photoelectron spectroscopy (XPS) analyses. Ion implantation on selected regions of the surface of polystyrene renders the implanted regions hydrophilic by the formation of hydrophilic groups. The cells are found to adhere well on the regions of the polystyrene implanted at a fluence of 1 × 10 15 ions/㎠. A simple ion implantation process was successfully used for cell patterning. Polystyrene was implanted with 100 keV Ar ions through a mask. The surface properties of the ion-implanted polystyrene were characterized by using Fourier transform-infrared spectroscopy (FT-IR), water contact angle measurement, and X-ray photoelectron spectroscopy (XPS) analyses. Ion implantation on selected regions of the surface of polystyrene renders the implanted regions hydrophilic by the formation of hydrophilic groups. The cells are found to adhere well on the regions of the polystyrene implanted at a fluence of 1 × 10 15 ions/㎠.

Evaluation of ion implantation for anti-thrombogenic coronary stent in vitro and in vivo

Shim, Jae-Won,Bae, In-Ho,Park, Dae Sung,Lim, Kyung-Seob,Lee, So-Youn,Jang, Eun-Jae,Park, Jun-Kyu,Kim, Ju Han,Jeong, Myung Ho Elsevier 2017 Journal of industrial and engineering chemistry Vol.54 No.-

<P><B>Abstract</B></P> <P>The aim of this study was to evaluate the effect of ion implantation on the surface of anti-thrombogenic coronary stent. Nitrogen (N) was implanted into the cobalt–chromium surface by using an ion source under a plasma environment to enhance its hardness and surface modification. The N ion dosage was 1×10<SUP>15</SUP> ions/cm<SUP>2</SUP>. All analysis results of the ion implanted stent were compared with those of bare metal stent. The N component and distribution were confirmed by auger electron spectroscopy. Microhardness was significantly increased after 40min of implantation (415.3±12.38 HV, 18.9±2.62%). The surface was altered to hydrophobic status through ion implantation (30.6±1.12% in contact angle increment). Platelet adhesion, and smooth muscle cell migration and proliferation were prevented in the ion implanted group (43.9%, 11.2%, and 45.1%, respectively). To verify the in vitro result, stents were implanted to rabbit iliac artery and isolated at 4 weeks post implantation. Then, the stents were subjected to histological analysis. No significant differences in injury score, internal elastic lamina, lumen area, and restenosis rate were found. However, the fibrin score was more significantly decreased in the ion beam-implanted group (2.5±0.15) than in the bare metal stent group (1.8±0.31, <I>n</I> =10, <I>p</I> <I><</I> 0.05). Taken together, ion beam implantation may be an efficient accessorial tool for preventing in-stent restenosis and in-stent thrombosis.</P>

Evaluation of ion implantation for anti-thrombogenic coronary stent in vitro and in vivo

심재원,배인호,박대성,임경섭,이소연,장은재,박준규,김주한,정명호 한국공업화학회 2017 Journal of Industrial and Engineering Chemistry Vol.54 No.-

The aim of this study was to evaluate the effect of ion implantation on the surface of anti-thrombogenic coronary stent. Nitrogen (N) was implanted into the cobalt–chromium surface by using an ion source under a plasma environment to enhance its hardness and surface modification. The N ion dosage was 1 1015 ions/cm2. All analysis results of the ion implanted stent were compared with those of bare metal stent. The N component and distribution were confirmed by auger electron spectroscopy. Microhardness was significantly increased after 40 min of implantation (415.3 12.38 HV, 18.9 2.62%). The surface was altered to hydrophobic status through ion implantation (30.6 1.12% in contact angle increment). Platelet adhesion, and smooth muscle cell migration and proliferation were prevented in the ion implanted group (43.9%, 11.2%, and 45.1%, respectively). To verify the in vitro result, stents were implanted to rabbit iliac artery and isolated at 4 weeks post implantation. Then, the stents were subjected to histological analysis. No significant differences in injury score, internal elastic lamina, lumen area, and restenosis rate were found. However, the fibrin score was more significantly decreased in the ion beam-implanted group (2.5 0.15) than in the bare metal stent group (1.8 0.31, n = 10, p < 0.05). Taken together, ion beam implantation may be an efficient accessorial tool for preventing in-stent restenosis and in-stent thrombosis.

Effects of Mg-ion and Ca-ion Implantations on P. gingivalis and F. nucleatum Adhesion

Sun Nyo Kang,정창모,전영찬,변응선,정용수,조리라 한국조직공학과 재생의학회 2014 조직공학과 재생의학 Vol.11 No.1

The purpose of this study was to evaluate the effects of ion implantation on Porphyromonas gingivalis (P. gingivalis) and Fusobacterium nucleatum (F. nucleatum) bacterial adhesion. Methods: Titanium (Ti) discs of 15 mm diameter and 1 mm in thickness (n = 42, 7 per group) were fabricated. Magnesium (Mg) and calcium (Ca) ions were implanted into the Ti surfaces using a plasma-source ion-implantation method. The roughness, chemistry, morphology, and contact angle of the titanium surfaces were analyzed using scanning electron microscopy, Rutherford back-scattering spectroscopy, Auger electron spectroscopy, and contact angle meter. P. gingivalis and F. nucleatum strains were cultured in anaerobic conditions at 37℃ for 72 hours, and all titanium specimens were dipped in the bacterial suspension at 37℃ for 24 hours. Specimens were examined at 1,000X× magnification using a fluorescence microscope. The number and total area of bacteria in each of 10 separate fields were determined by computer imaging analysis method. The resulting data was analyzed to assess the significance of observed differences based on the method of the surface treatment, ion implantation . Results: The number of P. gingivalis and F. nucleatum attached to the Mg- (927 and 227, respectively) and Ca-ion-implanted (1325 and 231, respectively) surfaces were greater than those attached to the non-implanted surfaces (306 and 98, P p < .001). Total area occupied by P. gingivalis adhesion was greater than those of F. nucleatum in the Mg- and Ca- ion-implanted surfaces (pP < .001). The types of ion and bacteria did not affect the amount of bacterial adhesion. Conclusion: Ion implantation enhanced the adhesions of P. gingivalis and F. nucleatum. Non-specific bonding derived from the electrostatic force affected by positively charged ions might be the predominant factor in bacterial adhesion. The possibility of specific bonding could not be ruled out in the Ca-ion- implanted surface.

Role of low energy transition metal ions in interface formation in ZnO thin films and their effect on magnetic properties for spintronic applications

Bhardwaj, Richa,Kaur, Baljeet,Singh, Jitendra Pal,Kumar, Manish,Lee, H.H.,Kumar, Parmod,Meena, R.C.,Asokan, K.,Hwa Chae, Keun,Goyal, Navdeep,Gautam, Sanjeev Elsevier 2019 APPLIED SURFACE SCIENCE - Vol.479 No.-

<P><B>Abstract</B></P> <P>In this study, X-ZnO/ZnO/Si(100) (X = Co, Ni and Cu) bilayer structure is fabricated using low energy ion implantation technique. Five different fluences 1 × 10<SUP>15</SUP>, 5 × 10<SUP>15</SUP>, 1 × 10<SUP>16</SUP>, 2.5 × 10<SUP>16</SUP> and 5 × 10<SUP>16</SUP> ions/cm<SUP>2</SUP> with 100 keV ion-beam energy were selected in order to implant the ions up to the depth of ≈44 nm as calculated through Stopping Range of Ion in Matter and Transport Range of Ions in Matter software. Structural modification was investigated by high resolution X-ray diffraction measurements in ZnO bilayer system. An observed systematic 2<I>θ</I> shift in (002) peak with increasing fluence implies increased density of implanted metal ions in ZnO matrix revealing the substitution of implanted ion at Zn-site. The mechanism of bilayer formation by ion-beam implantation technique has been discussed for metal-ions by investigating their interface properties. Atomic force microscopy reveals the morphological modification after ion implantation. Near-edge X-ray absorption fine-structure (NEXAFS) measurements at metal <I>K</I>- and <I>L</I> <SUB>3,2</SUB>-edges have been used to investigate the nature of implanted ions in terms of their valance state and local electronic environment. Further, O <I>K</I>-edge NEXAFS measurement for Ni-ZnO/ZnO/Si bilayer is highly sensitive to incident beam angles whereas no spectral change is seen for Zn <I>L</I>-edge measurements. The magnetic measurements were performed via vibrating sample magnetometer that showed the films are ferromagnetic at room temperature. The origin of ferromagnetism has been understood through defect mediated bound magnetic polaron model. Further, perpendicular magnetic anisotropy is also observed for Ni-ZnO/ZnO/Si bilayer structure at room temperature, which is correlated with the angle dependent O K-edge NEXAFS measurements. Fabrication of ZnO bilayer via ion implantation and investigation of above properties may prove useful in spin related and optoelectronic applications.</P> <P><B>Highlights</B></P> <P> <UL> <LI> Observance of RTFM in metal ion-implanted Ni-ZnO/ZnO/Si bilayer </LI> <LI> HRXRD and NEXAFS measurements confirms the wurtzite phase and Zn<SUP>2+</SUP> substitution in ZnO matrix. </LI> <LI> Angle dependent NEXAFS measurements provides the evidence of observed PMA. </LI> </UL> </P> <P><B>Graphical Abstract</B></P> <P>Mechanism of ion beam interaction X (X = Co, Ni and Cu) with ZnO lattice forming X-ZnO/ZnO/Si(100) bilayer structure. Films were implanted using a multi cathode source of negative-ions by cesium sputtering (MC-SNICS) and with the increasing ion flux, X can undergo one of two mechanisms of either substituting the Zn-site or occupy interstitial position in ZnO matrix. Angle dependent O K-edge NEXAFS measurements provides the evidence of perpendicular magnetic anisotropy in ZnO bilayer. </P> <P>[DISPLAY OMISSION]</P>