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빅데이터를 활용한 언택트 시대의 1인 콘텐츠 유통 사례 분석
왕덕원(Deok-won Wang),김정현(Jeong-hyeon Kim),손혜지(Hye-ji Son),전민준(Min-jun Jeon),최훈(Hun Choi) 한국정보통신학회 2021 한국정보통신학회 종합학술대회 논문집 Vol.25 No.1
코로나19 사태 이후, ‘사회적 거리두기’가 시행되면서 기존의 ‘대중문화’나 예능 프로그램들이 양방향커뮤니케이션을 하지 못하게 되며 쇠퇴하게 되었다. 이후 생겨난 ‘언택트 콘텐츠’는 BTS의 ‘방방콘’과 같은 언택트 공연이나 글로벌한 OTT(온라인 동영상 서비스)인 넷플릭스의 급성장 등으로 성장 가능성을 보여주고 있다. 또한 글로벌하고 언택트한 콘텐츠들은 대부분 온라인과 디지털에서 이루어지며 이는 엄청난 양의 빅데이터를 쏟아내게 된다는 것을 의미한다. 따라서 언택트 콘텐츠의 유통과정에서 쏟아지는 빅데이터를 분석하는 것은 소비자의 니즈를 파악하는 것에 많은 도움이 되며, 이에 따른 성장 기대치 또한 높을 것이다. 그래서 우리는 해당 연구주제와 관련해 기존 연구에서 진행되었던 연구 사례들을 찾아보고, 이를 통해 빅데이터가 언택트 시대의 콘텐츠 유통에 어떤 영향을 미칠 수 있을 것인지에 대해 분석하고자 한다. After the Korona 19, "social distancing" was implemented, existing "pop culture" or entertainment programs were unable to communicate in both directions and declined. Since then, "Untact content" has shown its potential to grow due to untouch performances such as BTS' "Bangbangcon" and the rapid growth of Netflix, a global OTT (online video service). In addition, most of the global and Untact content is online and digital, which means a huge amount of big data will be poured out. Therefore, analyzing the big data poured out during the distribution of untact content will help us identify consumers' needs, and the growth expectations will also be high. Therefore, we would like to explore the research cases that have been conducted in existing studies regarding the subject of the study and analyze how big data can affect the distribution of content in the Untact era.
Assessing the Deformity of Cleft Lip Nose Based on Neural Network
Xi, Wang,Vista IV, Felipe,Kim, Deok-Won,Chong, Kil-To 한국정밀공학회 2010 International Journal of Precision Engineering and Vol.11 No.3
The physical appearance of the nostril is important in the objective assessment of a cleft-lip patient while an objective quantitative evaluation is necessary to improve the result of the surgical procedure. The use of Kendall's coefficient of concordance (W) to identify consistency between several raters is proposed in this paper. Linear regression method was then compared with the Neural Network method to find out which is better in determining the consistency of data. The feature factors were extracted from a digital image of the nostril taking into consideration symmetry as the basis. Statistical and Neural Network methods were utilized to process and analyze the deformity assessment data. Two groups of raters were chosen to evaluate the deformity of the cleft lip/cleft nose based on photos shown to them. The angles and distance were measured with respect to the symmetrical aspect and the elementary reference score and factors were obtained through statistical analysis. Linear regression equations describing the relationship between the selected factors and the elementary score were formulated in order to obtain a more reliable reference data. The target data was pre-processed to achieve a more consistent and stable performance. A Neural Network was used to predict the evaluation score and it performed better than the linear regression method under certain conditions. The proposed method can give an objective evaluation to help surgeons evaluate their performance after a surgical procedure and find out if there is a need for further procedures to be done with lesser computational requirement over other existing three-dimensional algorithms.
Inhibition of IGF-1-induced sebum production by bilobetin in cultured human sebocytes
( Seung Mee Kim ),( Cong Wang ),( Dong Kyun Hong ),( Kyung Eun Jung ),( Chong Won Choi ),( Young Lee ),( Chang-deok Kim ),( Young-joon Seo ) 대한피부과학회 2019 대한피부과학회 학술발표대회집 Vol.71 No.2
Background: Bilobetin is one of biflavonoids isolated from crude leaf extracts of ginkgo biloba. We previously performed screening test using cultured human sebocytes, and found that bilobetin had a potential for inhibiting lipid production. Sebum production in sebocystes increases under the effects of various stimuli including androgens and insulin-like growth factor-1 (IGF-1). Excessive sebum production often leads to the onset of acne. Objectives: The aim of this study is to demonstrate the effects of bilobetin on IGF-1-induced lipogenesis in sebocytes. Methods: We pretreated SV40T-transformed sebocytes (SV-sebocytes) with bilobetin then stimulated with IGF-1. Effects of bilobetin on lipogenesis of sebocytes were examined by thin layer chromatography (TLC) and Western blot. Results: Bilobetin markedly inhibited IGF-1-induced lipid production in sebocytes, especially in terms of production of squalene and wax ester. Supporting these results, bilobetin showed significant inhibitory effect on squalene synthase promoter activity. In addition, bilobetin significantly down-regulated lipogenic transcription factors such as SREBP-1 and SREBP-2. To delineate the possible action mechanism, we investigated the effect of bilobetin on intracellular signaling. As a result, bilobetin inhibited IGF-1-induced phosphorylation of AKT. Conclusion: Together, these results suggest that bilobetin has an inhibitory potential on sebum production in sebocytes, being applicable for acne treatment.
In-Shik Han,Won-Ho Choi,Hyuk-Min Kwon,Min-Ki Na,Ying-Ying Zhang,Yong-Goo Kim,Jin-Suk Wang,Chang Yong Kang,Bersuker, G.,Byoung Hun Lee,Yoon Ha Jeong,Hi-Deok Lee,Jammy, R. IEEE 2009 IEEE electron device letters Vol.30 No.3
<P>Time-dependent dielectric breakdown (TDDB) characteristics of La<SUB>2</SUB>O<SUB>3</SUB>-doped high-k dielectric in Hf-based high-k/TaN metal gate stack were studied. Unlike the abrupt breakdown in the conventional SiO<SUB>2</SUB> , dielectric breakdown behaviors of La-incorporated HfON and HfSiON dielectrics show progressive breakdown characteristics. Moreover, the extracted Weibull slope beta of breakdown distribution is in the range of 0.87-1.19, and it is independent on capacitor areas and stress conditions. Moreover, field dependence of T<SUB>BD</SUB> and stress-induced leakage current strongly suggest that the E-model is more applicable to explain in TDDB of La-incorporated high-k dielectric in Hf-based high-k/metal gate stack structure.</P>
Stress Dependence of Thermal Stability of Nickel Silicide for Nano MOSFETs
Zhang, Ying-Ying,Lee, Won-Jae,Zhong, Zhun,Li, Shi-Guang,Jung, Soon-Yen,Lee, Ga-Won,Wang, Jin-Suk,Lee, Hi-Deok,Lim, Sung-Kyu The Korean Institute of Electrical and Electronic 2007 Transactions on Electrical and Electronic Material Vol.8 No.3
Dependence of the thermal stability of nickel silicide on the film stress of inter layer dielectric (ILD) layer has been investigated in this study and silicon nitride $(Si_3N_4)$ layer is used as an ILD layer. Nickel silicide was formed with a one-step rapid thermal process at $500^{\circ}C$ for 30 sec. $2000{\AA}$ thick $Si_3N_4$ layer was deposited using plasma enhanced chemical vapor deposition after the formation of Ni silicide and its stress was split from compressive stress to tensile stress by controlling the power of power sources. Stress level of each stress type was also split for thorough analysis. It is found that the thermal stability of nickel silicide strongly depends on the stress type as well as the stress level induced by the $Si_3N_4$ layer. In the case of high compressive stress, silicide agglomeration and its phase transformation from the low-resistivity nickel mono-silicide to the high-resistivity nickel di-silicide are retarded, and hence the thermal stability is obviously improved a lot. However, in the case of high tensile stress, the thermal stability shows the worst case among the stressed cases.
Study of Thermal Stability of Ni Silicide using Ni-V Alloy
Zhong, Zhun,Oh, Soon-Young,Lee, Won-Jae,Zhang, Ying-Ying,Jung, Soon-Yen,Li, Shi-Guang,Lee, Ga-Won,Wang, Jin-Suk,Lee, Hi-Deok,Kim, Yeong-Cheol The Korean Institute of Electrical and Electronic 2008 Transactions on Electrical and Electronic Material Vol.9 No.2
In this paper, thermal stability of Nickel silicide formed on p-type silicon wafer using Ni-V alloy film was studied. As compared with pure Ni, Ni-V shows better thermal stability. The addition of Vanadium suppresses the phase transition of NiSi to $NiSi_2$ effectively. Ni-V single structure shows the best thermal stability compared with the other Ni-silicide using TiN and Co/TiN capping layers. To enhance the thermal stability up to $650^{\circ}C$ and find out the optimal thickness of Ni silicide, different thickness of Ni-V was also investigated in this work.
Ni-Silicide 형성 후 후속공정 열처리에 의한 Abnormal Oxidation 현상을 As-doping된 Bulk와 SOI에서 비교 연구
정순연(Soon-Yen Jung),이원재(Won-Jae Lee),장잉잉(Ying-Ying Zhang),종준(Zhun Zhong),이세광(Shi-Guang Li),이가원(Ga-Won Lee),왕진석(Jin-Suk Wang),이희덕(Hi-Deok Lee) 대한전자공학회 2006 대한전자공학회 학술대회 Vol.2006 No.11
In this paper, we found an unintended oxidation on the Nickel-silicide surfaces, which arises only As doped substrate when we adopt it to the BF₂, B₁₁ and As doped substrates. The abnormal oxidation phenomena happened when As doped substrate is annealed after the NiSi formation. It is revealed that the main reason of the oxidation is the thermal energy that working between As and Si in the Silicide layer and substrate. Oxide distributes only above the silicide-island when the agglomeration happens. It is highly necessary to prevent the unwanted oxygen because it can cause fatal defects to the nano CMOSFET devices.