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SHIN, BYUL,PARK, IK,CHUNG, CHEE Gordon and Breach Science Publishers 2006 Integrated ferroelectrics Vol.78 No.-
<P>Inductively coupled plasma reactive ion etching of CoFeSiB magnetic thin films was studied in a Cl 2 /O 2 /Ar gas mix. The etch rate, etch selectivity and etch profile of this magnetic film were examined on varying gas concentration, coil rf power, gas pressure and dc-bias voltage. As the Cl 2 gas increased, the etch rate monotonously decreased and etch residues decreased but etch slope was slanted. The use of the TiN hard mask gave rise to high selectivity of CoFeSiB to the TiN mask due to large decrease in etch rate of TiN in Cl 2 /O 2 /Ar gas mix. The addition of O 2 into the gas mix led to the anisotropic etching of CoFeSiB films without the etch residues.</P>
Shin, Byul,Park, Ik Hyun,Kim, Tae Wan,Chung, Chee Won 한국공업화학회 2005 Journal of Industrial and Engineering Chemistry Vol.11 No.2
Dry etching of CoTb and CoZrNb magnetic thin films was studied using a hard mask in an inductively coupled plasma. A Cl₂/O₂/Ar gas mixture was selected as an etch gas and various hard masks, such as SiO₂, Ta and TiN, were employed. The TiN hard mask showed the highest etch selectivity to magnetic films among the three hard masks. As the O, concentration in a Cl₂/O₂/Ar gas mix increases, the etch profiles of magnetic films improved because of due to the increased etch selectivity. From Auger electron spectroscopy (AES) analysis of the etched magnetic films, no redeposited materials on the sidewall of the etched films were observed. From the etch characteristics and AES analysis, we propose that the etching of CoTb and CoZrNb films proceeded mainly by means of chemically assisted physical sputtering.
Byul-Ha-Na Lee(이별하나),Yong-Hee Kwon(권용희),Kyoung-Hee Shin(신경희),Hee-Seung Park(박희승) 한국원예학회 2010 원예과학기술지 Vol.28 No.3
‘Merlot’ 포도 품종의 수확전 ethyl oleate 처리는 외표피와 아표피의 두께를 감소시키며 착색을 현저히 향상시킨다. 무처리구의 과피 두께는 126-189㎛인데 반하여 처리 과실의 과피두께는 90-107㎛로 조사되었으며, 이러한 외표피와 아표피층의 두께 감소는 처리 후 외표피와 아표피를 구성하는 세포의 빠른 노화에 의하여 세포가 죽거나 탈수가 나타나기 때문인 것으로 조사되었다. 처리 후에 빠르게 과피 표면의 왁스층이 녹은 듯한 형태를 보이며 이는 착색을 증진시키는 것으로 관찰되었으며, 전체적인 안토시아닌 함량 역시 증가하는 것으로 조사되었다. 반면에 각각의 안토시아닌 함량에 있어서는 메톡시기와 결합하거나 유기산과 결합한 안토시아닌이 증가한 반면 수산기와 결합한 안토시아닌은 감소하는 경향이었다. Preharvest treatment with 4% ethyl oleate on ‘Merlot’ (Vitis vinifera L.) grape reduced the thickness of the epidermal and hypodermal layers with significantly enhanced pigmentation. Thickness of the skin in treated berries was 90-107 ㎛, whereas those in control berries were 126-189 ㎛. Decreases in the thickness of epidermal and hypodermal cell layers seemed to be due to cellular death or dehydration by rapid senescence after the treatment. Immediate change observed in treated berries was the deformation of the wax that appeared melted resulting in color improvement. Total anthocyanin was also increased by ethyl oleate treatment. Separate forms of anthocyanins, acylated and methoxylated anthocyanins increased, whereas hydroxylated anthocyanins tended to decrease.
차세대 자성 메모리에의 응용을 위한 나노미터 크기의 magnetic tunnel junction 패터닝
신별,박익현,정지원 한국공업화학회 2005 응용화학 Vol.9 No.1
High density plasma reactive ion etching of magnetic tunnel junction (MTJ) stack was performed in an inductively coupled plasma. The etch process of MTJ stack masked with the photoresist and electron beam resist was studied using Ar, Cl₂, BC1₃ and O₂ gas mixes and characterized in terms of etch profile and electrical properties. When MTJ stack was first etched down to CoFe free layer and the rest of MTJ stack was etched, the etch slope of MTJ stack was more vertical than MTJ stack etched by other methods. As Cl₂ concentration and process pressure increased and coil rf power and dc bias decreased, the electrical properties of MTJ stack were improved. BC1₃/Ar and Cl₂/Ar gases were more effective in obtaining steep slope of the etched MTJ stack than the any other gas. By using high density plasma etching of MTJ stack, steep etch slope and clean etch profile without redeposition could be obtained.