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카본 박막의 미세조직에 미치는 HiPIMS 공정조건의 영향
양재웅(Jae Woong Yang) 한국유화학회 2017 한국응용과학기술학회지 Vol.34 No.4
HiPIMS(High Power Impulse Magnetron Sputtering)를 이용하여 탄소 박막을 증착하였다. 파워, 압력, 바이어스 전압, duty cycle에 따른 탄소 박막의 특성과 미세조직을 조사하였다. HiPIMS 파워가 증가할수록 증착 두께는 증가하였으며 표면이 거칠어지는 경향을 보였다. 압력의 증가 또한 표면이 거칠어 지는 경향을 보였으나 증착 두께는 압력에 비례하지 않았다. 바이어스 전압이 증가함에 따라 조도가 나빠 졌고 증착 두께는 증가하다가 임계 바이어스 전압부터는 감소하는 경향을 보였다. 듀티 사이클의 변화는 아크 발생과 같은 문제를 유발했으며 이는 챔버 구조나 타겟의 크기 등에 영향을 받는다. XPS로 / 분율을 확인하였으며 / 분율이 DC 스퍼터링의 경우보다 HiPIMS의 경우가 더 큰 것을 확인하였다. Carbon thin films were deposited by HiPIMS(High Power Impulse Magnetron Sputtering). The properties and microstructures of carbon thin film were investigated with power, pressure, bias voltage and duty cycle. As the HiPIMS power increased, the deposition thickness increased and the surface tended to be rough. The increase in pressure also tended to make the surface rough, but the deposition thickness was not proportional to the pressure. As the bias voltage increased, the surface roughness became worse, the deposition thickness increased and then decreased from the critical bias voltage. Changes in the duty cycle have caused problems such as arcing, which is affected by the chamber structure and the size of the target. The / fractions of thin films were estimated by XPS and it was confirmed that the fraction of thin films made by HiPIMS were larger than the fraction of thin films made by DC sputtering.
JiCheng Ding,ChangWei Zou,QiMin Wang,Kun Zeng,SiCheng Feng 한국물리학회 2016 THE JOURNAL OF THE KOREAN PHYSICAL SOCIETY Vol.68 No.2
The huge potential of High-power impulse magnetron sputtering (HIPIMS) to improve the properties of deposited coatings has been verified. In this study, Ti-Si-N coatings were deposited on Si (111), glass and cemented carbide substrates by using HIPIMS. The influences of the peak voltage, duty cycle and total gas pressure on the transient peak current of the Ti90Si10 target was investigated in detailed. The (200) diffraction intensity decreased with increasing bias voltage from −50 V to −400 V. The hardness of the Ti-Si-N coatings deposited at various bias voltages and the internal stress at different bias voltages were studied. The results indicate that HIPIMS technology can considerably improve the mechanical capacity of the Ti-Si-N coatings, possibly due to the combined protection of the increased adhesive force with the substrate and the relatively high hardness, which are caused by densification and dislocation strengthening effects.
자장 구조 변화에 따른 High Power Impulse Magnetron Sputtering (HIPIMS)에서 Al-doped ZnO 박막 증착 특성
박동희,양정도,최지원,손영진,최원국,Park, Dong-Hee,Yang, Jeong-Do,Choi, Ji-Won,Son, Young-Jin,Choi, Won-Kook 한국재료학회 2010 한국재료학회지 Vol.20 No.12
Abstract In this study characteristics of Al-doped ZnO thin film by HIPIMS (High power impulse sputtering) are discussed. Deposition speed of HIPIMS with conventional balanced magnetic field is measured at about 3 nm/min, which is 30% of that of conventional RF sputtering process with the same working pressure. To generate additional magnetic flux and increase sputtering speed, electromagnetic coil is mounted at the back side of target. Under unbalanced magnetic flux from electromagnet with 1.5A coil current, deposition speed of AZO thin film is increased from 3 nm/min to 4.4 nm/min. This new value originates from the decline of particles near target surface due to the local magnetic flux going toward substrate from electromagnet. AZO film sputtered by HIPIMS process shows very smooth and dense film surface for which surface roughness is measured from 0.4 nm to 1 nm. There are no voids or defects in morphology of AZO films with varying of magnetic field. When coil current is increased from 0A to 1A, transmittance of AZO thin film decreases from 80% to 77%. Specific resistance is measured at about $2.9{\times}10-2\Omega{\cdot}cm$. AZO film shows C-axis oriented structure and its grain size is calculated at about 5.3 nm, which is lower than grain size in conventional sputtering.
Hee-bok Myoung,Teng Fei Zhang,Jong-Keuk Park,Doo-In Kim,Kwang Ho Kim 한국표면공학회 2012 한국표면공학회지 Vol.45 No.6
Cr-Ti-B-N coatings were synthesized by a hybrid coating system combining high power impulse magnetron sputtering (HIPIMS) and DC pulse magnetron sputtering from a TiB₂ and a Cr target in argon-nitrogen environment, respectively. By changing the power applied on the Cr and TiB₂ cathodes, the Cr-Ti-B-N coatings with various Ti/Cr ratio and B content were deposited. The phase structure, microstructure and chemical compositions of the Cr-Ti-B-N coatings were studied by X-ray diffraction (XRD), transmission scanning electron microscopy (TEM), and X-ray photoelectron spectroscopy (XPS). With increase of Cr element in the coatings, the nanocomposite microstructure consisting of nano-sized (Cr, Ti) N crystallites and amorphous BN phase were obtained in the coatings. The microhardness of the Cr-Ti-B-N coatings exhibited a peak value of ~41 GPa for the CrTi0.1B0.4N1.3, and then decreased with further increase of Cr content in the coatings, and all the coatings exhibited low friction coefficient. The oxidation and corrosion behavior of the Cr-Ti- B-N coatings revealed better properties due to the formation of a nanocomposite microstructure.
Elmkhah, H.,Zhang, T.F.,Abdollah-zadeh, A.,Kim, K.H.,Mahboubi, F. Elsevier Sequoia 2016 JOURNAL OF ALLOYS AND COMPOUNDS Vol.688 No.1
High power impulse magnetron sputtering (HIPIMS) is the new PVD technique that has been widely used to deposit hard coatings. In this work, titanium-aluminum nitride (TiAlN) coatings were synthesized through using the HIPIMS technique with various bias voltages from -50 to -200 V. The influence of bias voltage on the microstructure, mechanical, and tribological properties of the TiAlN coatings were investigated. The results indicate that the Al content in TiAlN coatings decreased due to the selective re-sputtering. The preferred orientation altered from (111) to (200) and the peak shifted to lower 2θ values which occurred as the bias voltage increased. The coatings with the best mechanical and tribological properties were obtained at the bias voltage of -150 and -100 V respectively. The influence of coating texture, surface roughness, and residual stress on the properties of the coatings was discussed.