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Substrate Effect on the Vertical Density Profile of Thin Photoresist Film
Yoon, Jin Goo,Zin, Wang-Cheol,Kim, Jeongsik,Lee, Jae-Woo,Ahn, Sung Il,Kim, Jaehyun The Conference of Photopolymer Science and Technol 2011 フォトポリマ-懇話會誌= Journal of photopolymer science and t Vol.24 No.2
<P>Vertical electron density (ED) profiles of photoresist film on three different substrates (bare, HMDS-primed, underlayer-coated Si wafer) were obtained using X-ray reflectivity analysis. Small amounts of density fluctuation at each depth of film were analyzed using distorted wave Born approximation fitting. Near the interface, the ED profiles of pure resin on three different substrates differed among substrates. In the bare Si wafer, ED decreased near the interface, whereas ED in the underlayer-coated Si wafer ED was homogeneous. These ED distributions near the interface were strongly dependent on the interfacial energy between resin and substrate. The approximate distributions of photoacid generators (PAGs) were obtained from the comparison of the ED distributions of pure resin and of photoresist containing PAG. When PAG was introduced, the ED profiles showed comparatively uniform increase. However, near the interface, the bare Si wafer showed a large depletion in ED, whereas the underlayer-coated Si wafer showed homogeneous ED. PAG distribution inside photoresist film was affected by both the ED distribution of pure resin and by the interaction between PAG and the substrate.</P>
Lee, Sang-In,Zin, Wang-Cheol,Ahn, Jong-Hyun American Scientific Publishers 2009 Journal of Nanoscience and Nanotechnology Vol.9 No.12
<P>The order-order transition temperature (T(OOT)) in blends of poly(styrene-b-isoprene-b-styrene) (S-I-S) triblock copolymer and polyisoprene (PI) homopolymer was investigated by using synchrotron small-angle X-ray scattering (SAXS). Pure triblock copolymer undergoes an order-order transition (OOT) from hexagonally ordered cylinder (HEX) to body centered cubic (BCC) phases. In order to investigate the effect of the molecular weight of the added homopolymer on T(OOT) of the triblock copolymer, various low-molecular-weight PI homopolymers were studied. The results revealed that T(OOT) was affected by the PI molecular weight. T(OOT) was reduced for blends having low-molecular-weight PI.</P>
Mechanism of Morphological Transition from Lamellar/Perforated Layer to Gyroid Phases
Ahn, Jong-Hyun,Zin, Wang-Cheol The Polymer Society of Korea 2003 Macromolecular Research Vol.11 No.3
We investigated epitaxial relations of phase transitions between the lamellar (L), hexagonally perforated layers (HPL), and gyroid (G) morphologies in styrene-isoprene diblock copolymer (PSI) and polyisoprene (PI)/PSI blend using rheology and small angle X-ray scattering (SAXS) techniques. In HPLlongrightarrowG transitions, six spot patterns of G phase were observed in two-dimensitional SAXS pattern. On the other hand, in direct L-longrightarrowG transition without appearance of HPL phase, the polydomain patterns of G phase were observed. From present study, it was understood that direct LlongrightarrowG transition of blend may be suppressed by high-energy barrier of transition and mismatches in domain orientation between epitaxially related lattice planes.
Alignment of Liquid Crystals Using a Molecular Layer with Patterned Molecular Density
Son, Jong‐,Ho,Zin, Wang‐,Cheol,Takezoe, Hideo,Song, Jang‐,Kun WILEY‐VCH Verlag 2012 Advanced Materials Vol.24 No.45
<P><B>The surface of self‐constructed molecular density modulation (SDM)</B> exhibits a wide range of liquid crystal alignment capabilities including planar, tilted, and homeotropic alignments, disclination‐free uniform and heterogeneous alignments, and even spatially varying alignments through the single non‐contact process. Alignment defects are eliminated by temporary lowering the frictional energy barrier via the open‐boundary elastic stabilization (OES) treatment.</P>