http://chineseinput.net/에서 pinyin(병음)방식으로 중국어를 변환할 수 있습니다.
변환된 중국어를 복사하여 사용하시면 됩니다.
Risk factors for child physical abuse and neglect among Chinese young mothers
Lo, Camilla K.M.,Tung, Keith T.S.,Chan, Ko Ling,Yip, Paul S.F.,Lau, Joseph T.F.,Wong, Wilfred H.S.,Wong, Rosa S.,Tsang, Anita M.C.,Tsang, Hannah Y.H.,Tso, Winnie W.Y.,Ip, Patrick Elsevier 2017 Child abuse & neglect Vol.67 No.-
<P><B>Abstract</B></P> <P>Although studies have reported a linkage between young pregnancy and child maltreatment risk, it is still unclear about what factors place young mothers at greater risk of maltreating their child in Chinese context. Based on the socio-ecological model, risk factors in 4 domains: family background/structure, maternal stressors, mother-child interaction, and child behavioral issue in relation to physical assault, neglect, both physical assault and neglect, and either physical assault or neglect among Chinese young mothers in Hong Kong were assessed. 392 young mothers were recruited from an integrated supportive program for young mothers. The mean age of mothers at delivery was 21.8 (SD=3.0) and 52.3% were married. Individual risk factors and cumulative risk domains related to different child maltreatment groups were examined. Our results show both overlapping and unique risk factors across the domains associated with physical assault and neglect. Further, young families exposed to higher number of risk domains show higher rates for physical assault and neglect, co-occurrence of physical assault and neglect, and either form of maltreatment. In addition, various risk domains were found to be particularly important for different forms of maltreatment: family background/structure domain was found to be an important risk domain for neglect; mother-child interaction domain for both physical assault and neglect; family background/structure and maternal stressors domains for either physical assault or neglect. Closer examination of a subgroup of adolescent mothers aged 18 and below shows that family background/structure was an important risk domain for this group.</P>
E-beam lithography and electrodeposition fabrication of thick nanostructured devices
Lo, T N,Chen, Y T,Chiu, C W,Liu, C J,Wu, S R,Lin, I K,Su, C I,Chang, W D,Hwu, Y,Shew, B Y,Chiang, C C,Je, J H,Margaritondo, G Institute of Physics [etc.] 2007 Journal of Physics. D, Applied Physics Vol.40 No.10
<P>A nanofabrication approach based on advanced e-beam lithography and electrodeposition successfully produced high-resolution (≈40 nm line width) metal structures with high aspect ratio (>12) and high density. The combination of these characteristics is essential for hard-x-ray optical components such as zone plates, for x-ray lithography masks and for other devices.</P>
Effect of Heat Treatment on the Pitting Corrosion Behavior of 347 SS Weld Overlay
Lo, I. H.,Lee, M. C.,Lin, K. Y.,Ho, W.,Yang, G. C. Y.,Tsai, W. T. 한국부식방식학회 2002 Corrosion Science and Technology Vol.31 No.5
The effect of heat treatment on the microstructural change and corrosion performance of 347 SS weld overlay has been investigated. The microstructure and phase changes of he as-weld and post weld heat-treated (PWHT) overlays were examined using optical microscropy (OM), scanning electron microscopy (SEM) and transmission electron microscopy (TEM). Energy dispersive X-ray analysis (EDS) was also used for intermetallic phase identification. The results showed that delta-ferrite transformation to sigma phase occurred for the as-weld overlay by PWHT at 690℃ for 8 hours. Pitting corrosion resistance of the weld with or without PWHT was evaluated by conducting potentiodynamic polarization tests in 3.5 % NaCl solution. The results showed that the presence of intermetallic phase greatly affected the pitting corrosion resistance of 347 SS weld overlay.
Tissue Expanders in Staged Calvarial Reconstruction: A Systematic Review
Andrea Y. Lo,Roy P. Yu,Anjali C. Raghuram,Michael N. Cooper,Holly J. Thompson,Charles Y. Liu,Alex K. Wong 대한성형외과학회 2022 Archives of Plastic Surgery Vol.49 No.6
Cranioplasties are common procedures in plastic surgery. The use of tissue expansion (TE) in staged cranioplasties is less common. We present two cases of cranioplasties with TE and systematically review literature describing the use of TE in staged cranioplasties and postoperative outcomes. A systematic review was performed by querying multiple databases. Eligible articles include published case series, retrospective reviews, and systematic reviews that described use of TE for staged bony cranioplasty. Data regarding study size, patient demographics, preoperative characteristics, staged procedure characteristics, and postoperative outcomes were collected. Of 755 identified publications, 26 met inclusion criteria. 85 patients underwent a staged cranioplasty with TE. Average defect size was 122 cm2, and 30.9% of patients received a previous reconstruction. Average expansion period was 14.2 weeks. The most common soft tissue closures were performed with skin expansion only (75.3%), free/pedicled flap (20.1%), and skin graft (4.7%). The mean postoperative follow-up time was 23.9 months. Overall infection and local complication rates were 3.53 and 9.41%, respectively. The most common complications were cerebrospinal fluid leak (7.1%), hematoma (7.1%), implant exposure (3.5%), and infection (3.5%). Factors associated with higher complication rates include the following: use of alloplastic calvarial implants and defects of congenital etiology (p¼0.023 and 0.035, respectively). This is the first comprehensive review to describe current practices and outcomes in staged cranioplasty with TE. Adequate soft tissue coverage contributes to successful cranioplasties and TE can play a safe and effective role in selected cases.
Computer-aided tumor diagnosis using shear wave breast elastography
Moon, W.K.,Huang, Y.S.,Lee, Y.W.,Chang, S.C.,Lo, C.M.,Yang, M.C.,Bae, M.S.,Lee, S.H.,Chang, J.M.,Huang, C.S.,Lin, Y.T.,Chang, R.F. Butterworth Scientific Ltd., etc.] 2017 Ultrasonics Vol.78 No.-
<P>The shear wave elastography (SWE) uses the acoustic radiation force to measure the stiffness of tissues and is less operator dependent in data acquisition compared to strain elastography. However, the reproducibility of the result is still interpreter dependent. The purpose of this study is to develop a computer-aided diagnosis (CAD) method to differentiate benign from malignant breast tumors using SWE images. After applying the level set method to automatically segment the tumor contour and hue-saturation value color transformation, SWE features including average tissue elasticity, sectional stiffness ratio, and normalized minimum distance for grouped stiffer pixels are calculated. Finally, the performance of CAD based on SWE features are compared with those based on B-mode ultrasound (morphologic and textural) features, and a combination of both feature sets to differentiate benign from malignant tumors. In this study, we use 109 biopsy-proved breast tumors composed of 57 benign and 52 malignant cases. The experimental results show that the sensitivity, specificity, accuracy and the area under the receiver operating characteristic ROC curve (Az value) of CAD are 86.5%, 93.0%, 89.9%, and 0.905 for SWE features whereas they are 86.5%, 80.7%, 83.5% and 0.893 for B-mode features and 90.4%, 94.7%, 92.3% and 0.961 for the combined features. The Az value of combined feature set is significantly higher compared to the B-mode and SWE feature sets (p = 0.0296 and p = 0.0204, respectively). Our results suggest that the CAD based on SWE features has the potential to improve the performance of classifying breast tumors with US. (C) 2017 Elsevier B.V. All rights reserved.</P>
100KW DC Arc Plasma of CVD System for Low Cost Large Area Diamond Film Deposition
Lu, F.X.,Zhong, G.F.,Fu, Y.L.,Wang, J.J.,Tang, W.Z.,Li, G.H.,Lo, T.L.,Zhang, Y.G.,Zang, J.M.,Pan, C.H.,Tang, C.X.,Lu, Y.P. The Korean Ceramic Society 1996 The Korean journal of ceramics Vol.2 No.4
In the present paper, a new type of DC arc plasma torch is disclosed. The principles of the new magnetic and fluid dynamic controlled large orifice long discharge tunnel plasma torch is discussed. Two series of DC Plasma Jet diamond film deposition equipment have been developed. The 20kW Jet equipped with a $\Phi$70 mm orifice torch is capable of deposition diamond films at a growth rate as high as 40$\mu\textrm{m}$/h over a substrate area of $\Phi$65 mm. The 100kW high power Jet which is newly developed based on the experience of the low power model is equipped with a $\Phi$120 mm orifice torch, and is capable of depositing diamond films over a substrate area of $\Phi$110 mm at growth rate as high as 40 $\mu\textrm{m}$/h, and can be operated at gas recycling mode, which allows 95% of the gases be recycled. It is demonstrated that the new type DC plasma torch can be easily scaled up to even higher power Jet. It is estimated that even by the 100kW Jet, the cost for tool grade diamond films can be as low as less than $4/carat.
ELECTRON TRAPPING AND DETRAPPING BEHAVIORS OF THIN THERMALLY NITRIDED OXIDES
ChEng, Y. C.,Wong, H.,Lo, H. B.,Lai, P. T.,Liu, Z. H. 대한전자공학회 1989 ICVC : International Conference on VLSI and CAD Vol.1 No.1
This work reports the electron trapping and de trapping behaviors of thin ($lt;300Å) thermally grown oxide annealed in pure ammonia at high temperature ($gt;1000℃). The phenomena are investigated by using the low-frequency noise measurement on MOSFETs, monitoring the flatband-voltage shift of MOS capacitor subjected to electron injection and shift of Fowler-Nordheim (FN) curve in high field region. Results indicate that the nitrided samples have particularly higher interface trap density at 0.43eV (below the conduction band of silicon) and a larger capture cross section than the conventional oxides, and the estimated centroid of the trap distribution is very close to the silicon-oxide interface. In addition, the trapped charge density is found to have a strong dependence on the nitridation conditions, and is lower for higher oxide field due to an increase of detrapping rate. On the other hand, electron conduction in the nitrided oxide films is mainly governed by the FN mechanism in low field ($lt;7 MV/cm) region and by the Pool-Frankel mechanism in highfield region where the traps assist the conduction.