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Self-Sealing of Nanoporous Low Dielectric Constant Patterns Fabricated by Nanoimprint Lithography
Ro, Hyun Wook,Peng, Huagen,Niihara, Ken-ichi,Lee, Hae-Jeong,Lin, Eric K.,Karim, Alamgir,Gidley, David W.,Jinnai, Hiroshi,Yoon, Do Y.,Soles, Christopher L. WILEY-VCH Verlag 2008 ADVANCED MATERIALS Vol.20 No.10
<B>Graphic Abstract</B> <P>The cross-sectional TEM image shows that line-space patterns can be directly imprinted, with high fidelity, into highly porous spin-on organosilicate materials. This publication quantifies how the porosity and distribution of pores within the patterns are affected by the nanoimprint lithography processes, including evidence for a densified pattern surface. <img src='wiley_img/09359648-2008-20-10-ADMA200701994-content.gif' alt='wiley_img/09359648-2008-20-10-ADMA200701994-content'> </P>