화학양면성의 전해이온수를 이용한 극자외선 마스크의 나노세정

유근걸,정윤원,최인식,김형원,최병선,Ryoo, Kun-kul,Jung, Youn-won,Choi, In-sik,Kim, Hyung-won,Choi, Byung-sun 한국반도체디스플레이기술학회 2021 반도체디스플레이기술학회지 Vol.20 No.2

Recent cleaning technologies of mask in extremely ultraviolet semiconductor processes were reviewed, focused on newly developed issues such as particle size determination or hydrocarbon and tin contaminations. In detail, critical particle size was defined and proposed for mask cleaning where nanosized particles and its various shapes would result in surface atomic ratio increase vigorously. A new cleaning model also was proposed with amphoteric behavior of electrolytically ionized water which had already shown excellent particle removing efficiency. Having its non-equilibrium and amphoteric properties, electrolyzed ion water seemed to oxidize contaminant surface selectively in nano-scale and then to lift up oxidized ones from mask surface very effectively. This assumption should be further investigated in future in junction with hydrogen bonding and cluster of water molecules.

탄소부품을 채용한 물 연화장치의 전기적 거동

유근걸 ( Kunkul Ryoo ),조태현 ( Taehyun Cho ),강동훈 ( David Kang ),이해인 ( Hyein Lee ),이기완 ( Ki-wan Lee ) 한국환경기술학회 2018 한국환경기술학회지 Vol.19 No.2

동부품 간에 물을 연화시키는 반응이 진행되었기 때문으로 추론할 수 있었다. 지하수의 경우, 장치의 내부에 물이 채워져 있을 때 탄소전극과 황동전극 간에 -400 mV에서 0 mV 정도의 다양한 범위의 전압이 형성됨을 알 수 있었으며, 극성을 바꾸었을 때 방향성 있는 전압이 형성됨도 알게 되었다. 물이 흐르는 동안 형성된 전압이 증가하여 0 V 가까이 접근하다가, 물을 정지시키면 전압이 감소하기 시작하여 하루 지나면 -150 mV, 이틀 후에 -300 mV 등의 변화를 거쳐 -400 mV 근처로 수렴하였으며, 다시 물을 흘리면 전압은 증가하고 물을 정지시키면 감소하는 현상이 정확히 가역적으로 반복되었다. 결론적으로 전압이 생성될 수 있는 이종 접촉물질은 탄소부품과 황동부품, 보다 이론적으로 탄소부품과 물 사이가 가장 가능성이 높다고 결론지을 수 있다. The electrical behavior of water softening system adopting carbon part was studied to understand the basic mechanism for water softening. The system showed very stable, reversible and repeatable softening behavior. pH of ultrapure water decreased from 7.5 to 6.5 and ORP increased from 0 mV to 100 mV at the same time while water flowing, showing that its oxidative power increased significantly due to the system. It was assumed from the result that it was due to the water softening reaction caused by two critical electrodes of carbon part and brass case under water medium. While underground water filled or flew through the system, the voltage was developed between carbon and brass parts and measured variably in a range of from -400 mV to 0 mV, and polarity was also clearly and importantly shown for the developed voltage. While water flowing the developed voltage was increased and maximized at around 0 V, and then after water stopped it dropped to -150 mV in a day and -300 mV in two days, and finally limited to about -400 mV in several days. Repeated water flowing and stopping also cycled the voltage changes reversibly as mentioned previously. It was, therefore, concluded that electrical voltage was developed by heterogeneous contact between carbon and brass parts under the water environment. Precisely speaking, it could be assumed that the most voltage drop was developed between carbon part and water since voltage drop between water and brass metal part is ignorable.

중성자 조사에 의해서 생성된 FZ 실리콘 웨이퍼 내의 점결함 및 저항 변화에 관한 연구

李芸燮,柳根傑 대한금속재료학회 2002 대한금속·재료학회지 Vol.40 No.3

The effect of irradiation damage on FZ silicon crystal properties has been studied by electrical measurements. 4 FZ silicon wafers of high resistivity of 1000∼2000Ω-㎝ with (100) orientation were irradiated with thermal neutron fluences of 1.815E18/㎠ and 6.406E18/㎠ by HANARO nuclear reactor to compare resistivity, point defect due to fluence differences. SRP results showed that the obtained resistivities approached to the designed ones. Point defect generation due to irradiation was observed using FTIR and DLTS. In the case of Si-1, two point defects were observed at 100 K and 230 K and they were named E_l and E_2. The sample of Si-2 had four point defects which were included two point defects of Si-1 sample. The two point defects of Si-2 were measured at 125K(E_4) and 300K(E_3). The point defects which were E_2 and E_3 were first observed in this study.

용융납에서 순철과 탄소강에 Cr 을 확산 피복 시킬때의 kinetics

김종희,이재영,유근걸 대한금속재료학회(대한금속학회) 1978 대한금속·재료학회지 Vol.16 No.1

소지금속 내의 Cr 확산이 어떠한 지배단계를 거쳐 이루어지는 지를 조사하기 위해 Cr이 용해되어 있는 용융납에서 순철과 탄소강에 Cr을 확산피복시켜 이때 형성되는 Cr 확산 피복층과 carbide 생성에 대한 kinetics를 침적시간, 용탕온도, 그리고 탄소합량에 중점을 두어 연구하였다. 순철의 경우 Crr 확산 피복층의 반응 지배 단계는 Cr의 확산임을 보여 주고 있으며 그때의 확산계수 D_a와 절대 온도와의 관계는 D_a=(1.505) exp[--52.8±7.7(㎉/mole)/RT] 와 같다. 또 시편 표면의 Cr 농도는 시편의 탄소함량에 따라 거의 비례적으로 증가하고 있으며 이에 수반하여 시편에 함유된 탄소는 확산해 들어간 Cr과 carbide를 형성하여 확산 피복층의 경도를 현저히 증가시켜 주고 있다. Kinetics associated with the formation of chromium diffusion coated layer and chromium carbide onto pure irons and carbon steels in molten lead was studied. Chromium diffusion process was carried out by dipping the specimen in molten lead bath containing dissolved chromium at various temperature and time. The effect of dipping time, bath temperature, and carbon content in the specimen on the diffusion process was described. The result indicated that for the pure iron, the rate controlling step was the chromium diffusion into the metal and the relationship between the diffusivity of chromium, D_a and absolute temperature T was D_a=(1.505) exp[-52.8±7.7(㎉/mole)/RT] The concentration of chromium in surface layer was increased almost linearly with carbon content in the specimen. The result also showed that the hardness of diffusion coated surface in carbon steal was greatly increased due to the formation of carbide.

EUV 세정에서 정전기 제어를 위한 전해이온수 거동의 분자궤도 이해

김형원,정윤원,최인식,최병선,김재영,유근걸 한국반도체디스플레이기술학회 2022 반도체디스플레이기술학회지 Vol.21 No.4

The electrostatic phenomenon seriously issued in extreme ultraviolet semiconductor cleaning was studied in junction with molecular dynamic aspect. It was understood that two lone pairs of electrons in water molecule were subtly different each other in molecular orbital symmetry, existed as two states of large energy difference, and became basis for water clustering through hydron bonds. It was deduced that when hydrogen bond formed by lone pair of higher energy state was broken, two types of [H2O]+ and [H2O]- ions would be instantaneously generated, or that lone pair of higher energy state experiencing reactions such as friction with Teflon surface could cause electrostatic generation. It was specifically observed that, in case of electrolyzed cathode water, negative electrostatic charges by electrons were overlapped with negative oxidation reduction potentials without mutual reaction. Therefore, it seemed that negative electrostatic development could be minimized in cathode water by mutual repulsion of electrons and [OH]- ions, which would be providing excellences on extreme ultraviolet cleaning and electrostatic control as well.

캘빈방전 효과를 이용한 초순수 및 전해이온수의 정전기

김형원,정윤원,최인식,최병선,최동현,유근걸 한국반도체디스플레이기술학회 2022 반도체디스플레이기술학회지 Vol.21 No.1

Despite the increasing importance of manufacturing and application R&D for ultrapure deionized water and electrolyzed ion water, various and systematic studies have not been conducted until now. In this study, the electrostatic discharge (ESD) behavior of electrolyzed ion water using a proton exchange membrane(PEM) was evaluated according to the type, flow rate, and bubble of electrolyzed ion water. In addition, by observing that Oxidation Reduction Potential (ORP) value returns to the unique value of electrolyzed ion water after electrostatic discharge, the possibility of two types of ions participating in electrostatic discharge ((H2O)n+ (assumed)) and ions for maintaining the characteristics of electrolyzed water could be inferred. In order to confirm the chemical structure and characteristics of the cations, in-depth research related to water molecular orbital energy or band gap should be followed.