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박운익(Park woon-Ik),이규봉(Lee kyu-bong),김세윤(Kim se-yoon),박길흠(Park kil-houm) 한국정보과학회 2008 정보과학회 컴퓨팅의 실제 논문지 Vol.14 No.6
TFT-LCD영상은 불균일한 휘도 변화를 어느정도 허용하고 있으며, 영상 전반에 걸쳐 나타나는 큰 휘도변화는 국부적으로 주변 영역과 차이가 나는 결함 영역을 찾는데 방해가 된다. SQI(Self Quotient Image)는 얼굴 인식 분야에서 저주파에 해당하는 조명성분을 제거 하는데 사용되어 왔으며, 일종의 High Pass Filter(고주파 통과 필터)형태이다. 본 논문에서는 SQI가 신호의 저주파 성분을 평활화 하는 효과를 가지면서 국부적인 변화를 유지하는 특성을 가지는데 착안하여, TFT-LCD영상에 존재하는 결함을 강조하는 알고리즘을 제안 하였다. 제안한 방법을 기존의 TFT-LCD영상 전처리 방법들과 비교하였을 때, 평활화 효과 및 결함 영역 강조 효과가 우수함을 확인할 수 있었다. The TFT-LCD image allows non-uniform illumination variation and that is one of main difficulties of finding defect region. The SQI (self quotient image) has the HPF (high pass filter) shape and is used to reduce low frequency-lightness component. In this paper, we proposed the TFT-LCD defect-enhancement algorithm using characteristics of the SQI, that is the SQI has low-frequency flattening effect and maintains local variation. The proposed method has superior flattening effect and defect-enhancement effect compared with previous the TFT-LCD image preprocessing.
증착 각도 조절 기반 패턴전사프린팅을 통한 패턴 형상의 제어
박태완,박운익 대한금속·재료학회 2020 대한금속·재료학회지 Vol.58 No.2
The nanofabrication of modern electronic devices requires advanced nanopatterning technologies. To fabricate desirable nanodevices with excellent device performance, controlling the shape and dimension of the pattern is very important. However, to achieve more facile and faster device fabrication, with better pattern resolution, pattern-tunability, process simplicity, and cost-effectiveness, some remaining challenges still need to be resolved. In this study, we introduce a simple and practical method to generate various patterns using a nanotransfer printing (nTP) process. To obtain functional materials with diverse shapes on a polymer replica pattern, in the nTP process we controlled the angle of deposition before transfer-printing. First, we obtained three different pattern shapes with a thickness of ~ 30 nm on polymethyl methacrylate (PMMA) replica patterns. Then, the deposited functional patterns on the PMMA patterns are successfully transfer-printed onto SiO2/Si substrates, showing line, L-shape line, and concavo-convex patterns. We observed the pattern shapes of the patterns by scanning electron microscope (SEM) and optical microscope. Moreover, we systemically analyzed how to form patterns of various shapes using one kind of master mold. We expect that this simple approach will be widely used to fabricate various useful patterns for electronic device applications.
강영림,박운익 한국전기전자재료학회 2021 전기전자재료학회논문지 Vol.34 No.4
For the past several decades, various next-generation patterning methods have been developed to obtain welldesigned nano-to-micro structures, such as imprint lithography, nanotransfer printing (nTP), directed self-assembly (DSA), Ebeam lithography, and so on. Especially, nTP process has much attention due to its low processing cost, short processing time, and good compatibility with other patterning techniques in achieving the formation of high-resolution functional patterns. To transfer functional patterns onto desirable substrates, the use of soft materials is required for precise replication of master mold. Here, we introduce a simple and practical nTP method to create highly ordered structures using various polymeric replica materials. We found that polymethyl methacrylate (PMMA), polystyrene (PS), and polyvinylpyridine (PVP) are possible candidates for replica materials for reliable duplication of Si master mold based on systematic analysis of pattern visualization. Furthermore, we successfully obtained well-defined metal and oxide nanostructures with functionality on target substrates by using replica patterns, through deposition and transfer process. We expect that the several candidates of replica materials can be exploited for effective nanofabrication of complex electronic devices.