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김기홍(Gee-Hong Kim),임형준(Hyung-Jun Lim),정미라(Mi-Ra Jeong),이재종(Jae-Jong Lee),최기봉(Kee-Bong Choi),이형석(Hyung-Seok Lee),도이미(Lee-Mi Do) 한국생산제조학회 2011 한국생산제조학회지 Vol.20 No.4
This paper shows the method of fabrication of a microlens array comprised of a Nipkow disk used in a large-area, high-speed confocal microscopy. A Nipkow disk has two components, a microlens array disk and a pinhole array disk. The microlens array focuses illumination light onto the pinhole array disk and redirects reflected light from a surface to a sensor. The microlens which are positioned in order on a disk have a hemispheric shape with a few tens of micron in diameter, and can be fabricated by a variety of methods like mechanical machining, semiconductor process, replication process like imprinting process. This paper shows how to fabricate the microlens array which has a long focal length by reflow and imprinting process.
마이크로 렌즈 디스크와 핀홀 디스크를 이용한 고속 공초점용 닙코 디스크 개발
김기홍(Gee Hong Kim),이형석(Hyung Seok Lee),김창규(Chang Kyu Kim),임형준(Hyung Jun Lim),이재종(Jae Jong Lee),최기봉(Kee Bong Choi) 한국생산제조학회 2014 한국생산제조학회지 Vol.23 No.6
This paper discusses the fabrication process for a Nipkow disk using micro?lens and pinhole disks. The confocal measuring system that uses the Nipkow disk has the advantage in measuring speed, because the Nipkow disk can simultaneously provide confocal images of all pixels in a CCD camera without requiring a lateral scanning unit. A micro?lens configuration, which focuses illumination on a pinhole, overcomes the low optical efficiency of the Nipkow disk system and allows its use in practical applications. This paper describes how to design the Nipkow disk in terms of numerical aperture, particularly for measuring the height of solder bumps in packaging application and for hybrid processes combining mechanical and semiconductor processes.
접촉식 리소그라피의 정렬공정을 위한 압전구동 초정밀 스테이지
최기봉(Kee-Bong Choi),이재종(Jae Jong Lee),김기홍(Gee Hong Kim),임형준(Hyung Jun Lim) 한국생산제조학회 2011 한국생산제조학회지 Vol.20 No.6
This paper proposed an alignment stage driven by piezo actuators for alignment process of a contact-type lithography. Among contact-type lithography processes, an UV-curable nanoimprint process is an unique process to be able to align patterns on upper and lower layers. An alignment stage of the UV-curable nanoimprint process requires nano-level resolution as well as high stiffness to overcome friction force due to contact moving. In this paper, the alignment stage consists of a compliant mechanism using flexure hinges, piezo actuators for high force generation, and capacitive sensors for high-resolution measurement. The compliant mechanism is implemented by four prismatic-prismatic compliant chains for two degree-of-freedom translations. The compliant mechanism is composed of flexure hinges with high stiffness, and it is directly actuated by the piezo actuators which increases the stiffness of the mechanism, also. The performance of the ultra-precision stage is demonstrated by experiments.
2 개의 병진-병진 관절형 병렬 탄성 메커니즘을 갖는 압전구동 소형 XY 스테이지
최기봉(Kee-Bong Choi),이재종(Jae Jong Lee),김기홍(Gee Hong Kim),임형준(Hyung Jun Lim) Korean Society for Precision Engineering 2013 한국정밀공학회지 Vol.30 No.12
In this paper, a miniaturized stage with two prismatic-prismatic joints (2-PP) type parallel compliant mechanism driven by piezo actuators is proposed. This stage consists of two layers which are a motion guide layer and an actuation layer. The motion guide layer has 2-PP type parallel compliant mechanism to guide two translational motions, whereas the actuation layer has two leverage type amplification mechanisms and two piezo actuators to generate forces. Since the volume of the stage is too small to mount displacement sensors, the piezo actuators embedding strain gauge sensors are chosen. With the strain gauge-embedded piezo actuators, a semi-control is implemented, which results in hysteresis compensation of the stage. As the results, the operating range of 30 ㎛, the resolution of 20 ㎚, and the bandwidth of 400 ㎐ in each axis were obtained in the experiments.
최기봉(Kee-Bong Choi),이재종(Jae Jong Lee),김기홍(Gee Hong Kim),임형준(Hyung Jun Lim),정대성,신은주(Eun Joo Shin) 한국생산제조학회 2011 한국생산제조시스템학회 학술발표대회 논문집 Vol.2011 No.4
This paper proposed an alignment stage for contact-type lithography process such as nano-imprint lithography process. The alignment stage is of a compliant mechanism driven by stack-type piezo actuators. Six piezo actuators are employed for 3-DOF planar motion. This stage accomplishing a high stiffness due to an antagonistic arrangement of the piezo actuators is actuated by differential forces of the antagonistic arrangement of the piezo actuators. The stage is designed and then proposed a new operational principle to generate the planar motion of the stage.