Improved electrocatalytic activity of electrodeposited Ni3S4 counter electrodes for dye- and quantum dot-sensitized solar cells

다국어 초록 (Multilingual Abstract)

Nickel sulfide (Ni3S4)films are deposited onto F-doped SnO2 (FTO) substrates using a facile one-steppotentiodynamic electrodeposition without any extra treatment. The potential sweep is between0.9 Vand 0.7 V (vs. Ag/AgCl) for 4–10 cycles. The series resistance is gradually reduced with increased Ni3S4film thickness, indicating the metallic conduction of the Ni3S4 phase. The Ni3S4 deposited for 8 cycles(denoted FTO/Ni3S4-8) exhibits full coverage on the FTO substrate, with 110 nm thickness and adistinctive structure of porous and nanoscale interconnecting nanoparticular networks, which providenumerous electrochemical active sites to contact with electrolyte. Thefilm not only exhibits prominentelectrocatalytic activities but also shows excellent electrochemical stability in both polysulfide andiodide-based electrolytes compared to FTO/Pt. On the contrary, the FTO/Ni3S4-10 shows merged clusters,leading to more compact and less porous morphology, which reduced electrocatalytic activity. Thequantum dot-sensitized solar cell (QD-SSC) fabricated using the FTO/Ni3S4-8 counter electrode (CE)exhibits power conversion efficiency (PCE) of 4.57%, short-circuit current (Jsc) of 15.92 mA cm 2,open-circuit voltage (Voc) of 0.545 V, andfill factor (FF) of 52.63%. In addition, the dye-sensitized solar cell(D-SSC) using FTO/Ni3S4-8 CE achieves a PCE of 8.17%, Jsc of 16.28 mA cm 2, Voc of 0.735 V, and FF of68.34%. On the other hand, the PCEs of 2.56% and 7.58% are obtained for QD-SSC and D-SSC with Pt CE,respectively. We suggest that the electrodeposited Ni3S4 should be promising electrocatalytic electrodesfor various applications such as QD-SSCs, D-SSCs, supercapacitors, photoelectrochemical water-splittingcells, and batteries.

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