열처리 온도에 따른 TiO2/Ag/TiO2 박막의 근적외선 반사 특성 변화 = Research Effect of Annealing Temperature on the Low Emissivity of TiO2/Ag/TiO2 Films

다국어 초록 (Multilingual Abstract)

Ag intermediated TiO2 films were deposited by RF and DC magnetron sputtering and then vacuum annealed at 100, 200 and 300℃ for 30 minutes to investigate the effect of annealing temperature on the structural and optical properties of the films. For all depositions, the thickness of the TiO2 and Ag films were kept constant at 24 and 15 nm by controlling the deposition time. As-deposited TiO2/Ag/TiO2 trilayer films have a weak crystalline and an optical reflectance in a near infrared wavelength region of 77.8%, while the films annealed at 300℃ show the polycrystalline structure and an increased mean optical reflectance of 80.4%. From the experimental results, it can be concluded that increasing the annealing temperature enhanced the structural and optical properties of the TiO2/Ag/TiO2 films.(Received April 21, 2015; Revised May 6, 2015; Aocepted May 14, 2015)