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https://www.riss.kr/link?id=O36662316
2000년
eng
0161-6374
2576-1579
학술저널
PROCEEDINGS- ELECTROCHEMICAL SOCIETY PV
512-519 [※수록면이 p5 이하이면, Review, Columns, Editor's Note, Abstract 등일 경우가 있습니다.]
1566772788
Chemical vapor deposition; CVD XV
International symposium; 15th
Toronto, Canada
2000; May
0
상세조회0
다운로드
Atomistic Modeling of Chemical Vapor Deposition: NO on the Si (001) (2x1) Reconstructed Surface
Simulation of Surface Diffusion of Silicon and Hydrogen on Single Crystal Silicon Surfaces
Activation Energy Study for the Nucleation and Growth Stages of Cu(TMVS)(HFAC) Sourced Copper CVD
Development of Gas Phase and Surface Kinetic Schemes for the MOCVD of CdTe, ZnS and ZnSe