Synthesis by successive ionic layer deposition (SILD) methodology and characterization of gold nanoclusters on the surface of tin and indium oxide films

다국어 초록 (Multilingual Abstract)

<P><B>Abstract</B></P><P>The ability of successive ionic layer deposition (SILD) technology to synthesize gold clusters on the surface of tin(IV) oxide and indium(III) oxide films is discussed. It was shown that during the process, concentration of active sites that are capable of absorbing gold ions, and the size of the gold particles thus formed, may be controlled by both concentration of the solutions used and the number of SILD cycles. Thus, SILD methodology, employing separate and multiple stages of adsorption and reduction of adsorbed species, has considerable potential for customizing the properties of the deposited metal nanoparticles. In particular, it is shown that during the deposition of gold nanoparticles on the surface of tin(IV) oxide and indium(III) oxide films by SILD methodology, conditions can be realized under which the size of gold nanoclusters may be controllably varied between 1-3 nm and 50 nm. A model is proposed for the formation of gold clusters during the SILD process.</P>