<P><B>Abstract</B></P> <P>The aim of this study is to evaluate the micropollutant removal capacity of a 275 nm light-emitting diode (LED)-UV/chlorine system. The sulfamethoxazole, ibuprofen, and nitrobenzene removal effi...
http://chineseinput.net/에서 pinyin(병음)방식으로 중국어를 변환할 수 있습니다.
변환된 중국어를 복사하여 사용하시면 됩니다.
https://www.riss.kr/link?id=A107452125
2018
-
SCI,SCIE,SCOPUS
학술저널
1351-1357(7쪽)
0
상세조회0
다운로드다국어 초록 (Multilingual Abstract)
<P><B>Abstract</B></P> <P>The aim of this study is to evaluate the micropollutant removal capacity of a 275 nm light-emitting diode (LED)-UV/chlorine system. The sulfamethoxazole, ibuprofen, and nitrobenzene removal effi...
<P><B>Abstract</B></P> <P>The aim of this study is to evaluate the micropollutant removal capacity of a 275 nm light-emitting diode (LED)-UV/chlorine system. The sulfamethoxazole, ibuprofen, and nitrobenzene removal efficiencies of this system were compared with those of a conventional 254 nm low-pressure (LP)-UV system as a function of the UV dose. In a direct photolysis system, the photon reactivity of sulfamethoxazole is higher than that of nitrobenzene and ibuprofen at both wavelengths. The molar absorption coefficients and quantum yields of each micropollutant were as follows: sulfamethoxazole (<I>ε</I> <SUB> <I>SMX</I>, 275 <I>nm</I> </SUB> <SUP> <I>protonated</I> </SUP> = 17,527 M<SUP>−1</SUP> cm<SUP>−1</SUP>, Φ<SUB> <I>SMX</I>, 275 <I>nm</I> </SUB> <SUP> <I>protonated</I> </SUP> = 0.239, <I>ε</I> <SUB> <I>SMX</I>, 275 <I>nm</I> </SUB> <SUP> <I>deprotonated</I> </SUP> = 8430 M<SUP>−1</SUP> cm<SUP>−1</SUP>, and Φ<SUB> <I>SMX</I>, 275 <I>nm</I> </SUB> <SUP> <I>deprotonated</I> </SUP> = 0.026), nitrobenzene (<I>ε</I> <SUB> <I>NB</I>, 275 <I>nm</I> </SUB> = 7176 M<SUP>−1</SUP> cm<SUP>−1</SUP> and Φ<SUB> <I>NB</I>, 275 <I>nm</I> </SUB> = 0.057), and ibuprofen (<I>ε</I> <SUB> <I>NB</I>, 275 <I>nm</I> </SUB> = 200 M<SUP>−1</SUP> cm<SUP>−1</SUP> and Φ<SUB> <I>IBF</I>, 275 <I>nm</I> </SUB> = 0.067). The photon reactivity of chlorine species, i.e., HOCl and OCl-, were determined at 275 nm (<I>ε</I> <SUB> <I>HOCl</I>, 275 <I>nm</I> </SUB> = 28 M<SUP>−1</SUP> cm<SUP>−1</SUP>, Φ<SUB> <I>HOCl</I>, 275 <I>nm</I> </SUB> = 1.97, <I>ε</I> <SUB> <I>OCl</I>−, 275 <I>nm</I> </SUB> = 245 M<SUP>−1</SUP> cm<SUP>−1</SUP>, and Φ<SUB> <I>OCl</I>−, 275 <I>nm</I> </SUB> = 0.8), which indicate that the decomposition rate of OCl<SUP>−</SUP> is higher and that of HOCl is lower by 275 nm photolysis than that by 254 nm photolysis (<I>ε</I> <SUB> <I>HOCl</I>, 254 <I>nm</I> </SUB> = 60 M<SUP>−1</SUP> cm<SUP>−1</SUP>, Φ<SUB> <I>HOCl</I>, 254 <I>nm</I> </SUB> = 1.46, <I>ε</I> <SUB> <I>OCl</I>−, 254 <I>nm</I> </SUB> = 58 M<SUP>−1</SUP> cm<SUP>−1</SUP>, and Φ<SUB> <I>OCl</I>−, 254 <I>nm</I> </SUB> = 1.11). In the UV/chlorine system, the removal rates of ibuprofen and nitrobenzene were increased by the formation of OH and reactive chlorine species. The 275-nm LED-UV/chlorine system has higher radical yields at pH 7 and 8 than the 254 nm LP-UV/chlorine system.</P> <P><B>Highlights</B></P> <P> <UL> <LI> Micropollutants could be oxidized by 275 nm LED-UV alone and -UV/chlorine systems </LI> <LI> Direct photolysis reactivity of selected micropollutants were determined at 275 nm </LI> <LI> Radical yields from chlorine photolysis depend on the wavelength, pH, and Cl<SUB>2</SUB> dose </LI> <LI> 275 nm UV/chlorine system has higher removal efficiencies at pH 7 and 8 than 254 nm </LI> <LI> Higher photo-reactivity of OCl<SUP>−</SUP> at 275 nm than at 254 nm gives higher radical yields </LI> </UL> </P> <P><B>Graphical abstract</B></P> <P>[DISPLAY OMISSION]</P>