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      KCI등재 SCI SCIE SCOPUS

      Study on the Fabrication of Silicon Nanoparticles in an Amorphous Silicon Light Absorbing Layer for Solar Cell Applications

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      https://www.riss.kr/link?id=A104212279

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      다국어 초록 (Multilingual Abstract)

      Hydrogenated amorphous-silicon (a-Si:H) thin-film solar cells have advantages of relatively simple technology, less material consumption, higher absorption ratio compared to crystalline silicon, and low cost due to the use of cheaper substrates rather than silicon wafers. However, together with those advantages, amorphous-silicon thin-film solar cells face several issues such as a relatively lower efficiency, a relatively wider bandgap, and the Staebler-Wronski effect (SWE) compared to other competing materials (<i>i.e.</i>, crystalline silicon, CdTe, Cu(In<sub>x</sub>Ga<sub>(1−x)</sub>)Se<sub>2</sub> (CIGS), <i>etc.</i>). As a remedy for those drawbacks and a way to enhance the cell conversion efficiency at the same time, the employment of crystalline silicon nanoparticles (Si-NPs) in the a-Si matrix is proposed to organize the quantum-dot (QD) structure as the light-absorbing layer. This structure of the light absorbing layer consists of single-crystal Si-NPs in an a-Si:H thin-film matrix. The single-crystal Si-NPs are synthesized by using SiH4 gas decomposition with CO<sub>2</sub> laser pyrolysis, and the sizes of Si-NPs are calibrated to control their bandgaps. The synthesized size-controlled Si-NPs are directly transferred to another chamber to form a QD structure by using co-deposition of the Si-NPs and the a-Si:H matrix. Transmission electron microscopy (TEM) analyses are employed to verify the sizes and the crystalline properties of the Si-NPs alone and of the Si-NPs in the a-Si:H matrix. The TEM results show successful co-deposition of size-controlled Si-NPs in the a-Si:H matrix, which is meaningful because it suggests the possibility of further enhancement of the a-Si:H solar-cell structure and of tandem structure applications by using a single element.
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      Hydrogenated amorphous-silicon (a-Si:H) thin-film solar cells have advantages of relatively simple technology, less material consumption, higher absorption ratio compared to crystalline silicon, and low cost due to the use of cheaper substrates rather...

      Hydrogenated amorphous-silicon (a-Si:H) thin-film solar cells have advantages of relatively simple technology, less material consumption, higher absorption ratio compared to crystalline silicon, and low cost due to the use of cheaper substrates rather than silicon wafers. However, together with those advantages, amorphous-silicon thin-film solar cells face several issues such as a relatively lower efficiency, a relatively wider bandgap, and the Staebler-Wronski effect (SWE) compared to other competing materials (<i>i.e.</i>, crystalline silicon, CdTe, Cu(In<sub>x</sub>Ga<sub>(1−x)</sub>)Se<sub>2</sub> (CIGS), <i>etc.</i>). As a remedy for those drawbacks and a way to enhance the cell conversion efficiency at the same time, the employment of crystalline silicon nanoparticles (Si-NPs) in the a-Si matrix is proposed to organize the quantum-dot (QD) structure as the light-absorbing layer. This structure of the light absorbing layer consists of single-crystal Si-NPs in an a-Si:H thin-film matrix. The single-crystal Si-NPs are synthesized by using SiH4 gas decomposition with CO<sub>2</sub> laser pyrolysis, and the sizes of Si-NPs are calibrated to control their bandgaps. The synthesized size-controlled Si-NPs are directly transferred to another chamber to form a QD structure by using co-deposition of the Si-NPs and the a-Si:H matrix. Transmission electron microscopy (TEM) analyses are employed to verify the sizes and the crystalline properties of the Si-NPs alone and of the Si-NPs in the a-Si:H matrix. The TEM results show successful co-deposition of size-controlled Si-NPs in the a-Si:H matrix, which is meaningful because it suggests the possibility of further enhancement of the a-Si:H solar-cell structure and of tandem structure applications by using a single element.

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      참고문헌 (Reference)

      1 A. Gupta, 19 : 696-, 2009

      2 Z. Kang, 21 : 661-, 2009

      3 X. D. Pi, 19 : 245603-, 2008

      4 D. S. English, 2 : 681-, 2002

      5 A. Gupta, 12 : 518-, 2010

      6 X. Li, 19 : 8490-, 2003

      7 M. Ehbrecht, 59 : 2975-, 1999

      8 L. Pavesi, "Silicon Nanocrystals: Fundamentals, Synthesis and Applications" Wiley-VCH Verlag GmbH & Co. KGaA 2010

      9 김광수, "Formation of Silicon Nanoparticles Using SiH4 Pyrolysis at Atmospheric- and Low-Pressure" 한국물리학회 54 (54): 1021-1026, 2009

      1 A. Gupta, 19 : 696-, 2009

      2 Z. Kang, 21 : 661-, 2009

      3 X. D. Pi, 19 : 245603-, 2008

      4 D. S. English, 2 : 681-, 2002

      5 A. Gupta, 12 : 518-, 2010

      6 X. Li, 19 : 8490-, 2003

      7 M. Ehbrecht, 59 : 2975-, 1999

      8 L. Pavesi, "Silicon Nanocrystals: Fundamentals, Synthesis and Applications" Wiley-VCH Verlag GmbH & Co. KGaA 2010

      9 김광수, "Formation of Silicon Nanoparticles Using SiH4 Pyrolysis at Atmospheric- and Low-Pressure" 한국물리학회 54 (54): 1021-1026, 2009

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      학술지 이력

      학술지 이력
      연월일 이력구분 이력상세 등재구분
      2023 평가예정 해외DB학술지평가 신청대상 (해외등재 학술지 평가)
      2020-01-01 평가 등재학술지 유지 (해외등재 학술지 평가) KCI등재
      2011-01-01 평가 등재학술지 유지 (등재유지) KCI등재
      2009-01-01 평가 등재학술지 유지 (등재유지) KCI등재
      2007-01-01 평가 SCI 등재 (등재유지) KCI등재
      2005-01-01 평가 등재학술지 유지 (등재유지) KCI등재
      2002-07-01 평가 등재학술지 선정 (등재후보2차) KCI등재
      2000-01-01 평가 등재후보학술지 선정 (신규평가) KCI등재후보
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      기준연도 WOS-KCI 통합IF(2년) KCIF(2년) KCIF(3년)
      2016 0.47 0.15 0.31
      KCIF(4년) KCIF(5년) 중심성지수(3년) 즉시성지수
      0.26 0.2 0.26 0.03
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