RISS 학술연구정보서비스

검색
다국어 입력

http://chineseinput.net/에서 pinyin(병음)방식으로 중국어를 변환할 수 있습니다.

변환된 중국어를 복사하여 사용하시면 됩니다.

예시)
  • 中文 을 입력하시려면 zhongwen을 입력하시고 space를누르시면됩니다.
  • 北京 을 입력하시려면 beijing을 입력하시고 space를 누르시면 됩니다.
닫기
    인기검색어 순위 펼치기

    RISS 인기검색어

      KCI등재 SCIE SCOPUS

      THERMAL PLASMA DECOMPOSITION OF FLUORINATED GREENHOUSE GASES

      한글로보기

      https://www.riss.kr/link?id=A104228700

      • 0

        상세조회
      • 0

        다운로드
      서지정보 열기
      • 내보내기
      • 내책장담기
      • 공유하기
      • 오류접수

      부가정보

      다국어 초록 (Multilingual Abstract)

      Fluorinated compounds mainly used in the semiconductor industry are potent greenhouse gases. Recently, thermal plasma gas scrubbers have been gradually replacing conventional burn-wet type gas scrubbers which are based on the combustion of fossil fuel...

      Fluorinated compounds mainly used in the semiconductor industry are potent greenhouse gases. Recently, thermal plasma gas scrubbers have been gradually replacing conventional burn-wet type gas scrubbers which are based on the combustion of fossil fuels because high conversion efficiency and control of byproduct generation are achievable in chemically reactive high temperature thermal plasma. Chemical equilibrium composition at high temperature and numerical analysis on a complex thermal flow in the thermal plasma decomposition system are used to predict the process of thermal decomposition of fluorinated gas. In order to increase economic feasibility of the thermal plasma decomposition process, increase of thermal efficiency of the plasma torch and enhancement of gas mixing between the thermal plasma jet and waste gas are discussed. In addition,noble thermal plasma systems to be applied in the thermal plasma gas treatment are introduced in the present paper.

      더보기

      참고문헌 (Reference)

      1 T. Watanabe, "Water Plasma Generation under Atmospheric Pressure for Waste Treatment" 5 : 30-34, 2005

      2 J. P. Fournier, "Utilizing a Portable Cycle Purge Nitrogen Venturi for Removal of Process Gases in Semiconductor Processing gas Systems" 10 : 3376-3377, 1992

      3 A. B. Murphy, "Transport Coefficients of Argon, Nitrogen, Oxygen, Argon-Nitrogen, and Argon- Oxygen Plasmas" 14 : 451-490, 1994

      4 A. B. Murphy, "Transport Coefficients of Air, Argon-Air, Nitrogen-Air, and Oxygen-Air Plasmas" 15 : 279-307, 1995

      5 J. M. Park, "Three-Dimensional Modeling of Arc Root Rotation by External Magnetic Field in Nontransferred Thermal Plasma Torches" 32 : 479-487, 2004

      6 D. R. Burgess, Jr, "Thermochemical and Chemical Kinetic Data for Fluorinated Hydrocarbons" 21 : 453-529, 1996

      7 J. Heberlein, "Thermal plasma waste treatment" 41 : 053001-, 2008

      8 R. Benocci, "Thermal Plasmas for Hazardous Waste Treatment" World Scientific 1995

      9 P. Fauchais, "Thermal Plasmas" 25 : 1258-1280, 1997

      10 E. Pfender, "Thermal Plasma Technology: Where Do We Stand and Where Are We Going?" 19 : 1-31, 1999

      1 T. Watanabe, "Water Plasma Generation under Atmospheric Pressure for Waste Treatment" 5 : 30-34, 2005

      2 J. P. Fournier, "Utilizing a Portable Cycle Purge Nitrogen Venturi for Removal of Process Gases in Semiconductor Processing gas Systems" 10 : 3376-3377, 1992

      3 A. B. Murphy, "Transport Coefficients of Argon, Nitrogen, Oxygen, Argon-Nitrogen, and Argon- Oxygen Plasmas" 14 : 451-490, 1994

      4 A. B. Murphy, "Transport Coefficients of Air, Argon-Air, Nitrogen-Air, and Oxygen-Air Plasmas" 15 : 279-307, 1995

      5 J. M. Park, "Three-Dimensional Modeling of Arc Root Rotation by External Magnetic Field in Nontransferred Thermal Plasma Torches" 32 : 479-487, 2004

      6 D. R. Burgess, Jr, "Thermochemical and Chemical Kinetic Data for Fluorinated Hydrocarbons" 21 : 453-529, 1996

      7 J. Heberlein, "Thermal plasma waste treatment" 41 : 053001-, 2008

      8 R. Benocci, "Thermal Plasmas for Hazardous Waste Treatment" World Scientific 1995

      9 P. Fauchais, "Thermal Plasmas" 25 : 1258-1280, 1997

      10 E. Pfender, "Thermal Plasma Technology: Where Do We Stand and Where Are We Going?" 19 : 1-31, 1999

      11 S. Choi, "Thermal Plasma Technology for Non-Degradable Greenhouse Gases Treatment" 2011

      12 A. Gleizes, "Thermal Plasma Modeling" 38 : R153-R183, 2005

      13 S. Choi, "Thermal Plasma Characterization on Long DC Arc Discharge for Waste Treatment" (22-25) : 2011

      14 홍상희, "Thermal Plasma Analysis for the Pyrolysis of PFCs on a Large Scale" 한국물리학회 55 (55): 1819-1824, 2009

      15 B. E. Launder, "The Numerical Computation of Turbulent Flows" 31 : 269-289, 1974

      16 S. Futamura, "Synergy of Nonthermal Plasma and Catalysts in the Decomposition of Fluorinated Hydrocarbons" 63 : 949-954, 2005

      17 B. A. Wofford, "Surface-Wave Plasma Abatement of CHF3 and CF4 Containing Semiconductor Process Emissions" 33 : 1892-1897, 1999

      18 J. -F. Brilhac, "Study of the Dynamic and Static Behavior of dc Vortex Plasma Torch: Part II: Well-Type Cathode" 15 : 257-277, 1995

      19 K. Urashima, "Removal of C2F6 from a Semiconductor Process Flue Gas by a Ferroelectric Packed-Bed Barrier Discharge Reactor with an Adsorber" 37 : 1456-1463, 2001

      20 J. P. Chang, "Plasma-Surface Interactions" 21 : 145-S151, 2003

      21 E. Pfender, "Plasma Jet Behavior and Modeling Associated with the Plasma Spray Process" 238 : 228-241, 1994

      22 X. P. Xu, "Plasma Abatement of Perfluorocompounds in Inductively Coupled Plasma Reactors" 18 : 213-231, 2000

      23 J. V. Gompel, "PFCs in the Semiconductor Industry: A Primer" 23 : 321-330, 2000

      24 T. Streif, "PFC Reduction through Process and Hardware Optimization" 20 : 129-134, 1997

      25 S. J. Yu, "Oxidative Conversion of PFC via Plasma Processing with Dielectric Barrier Discharges" 21 : 311-327, 2001

      26 I. Namose, "Optimization of Gas Utilization in Plasma Processes" 16 : 429-435, 2003

      27 S. H. Hong, "Optimal Design and Fabrication Technology of Thermal Plasma Torches for Industrial Application" Seoul National University 2005

      28 김태희, "Numerical simulation on the influence of water spray in thermal plasma treatment of CF4 gas" 한국물리학회 12 (12): 509-514, 2012

      29 S. Choi, "Numerical analysis on a thermal plasma reactor for HFC-23 treatment" Elsevier 11 (11): S94-S98, 201109

      30 S. Samukawa, "New Radical Control Method for High-Performance Dielectric Etching with Nonperfluorocompound Gas Chemistries in Ultrahigh- Frequency Plasma" 17 : 2551-2556, 1999

      31 Narengerile, "Mechanisms of Decomposition of Organic Compoundsby Water Plasmas at Atmospheric Pressure" 50 (50): 13-, 2011

      32 Sung-Han Han, "Large Scale Treatment of Perfluorocompounds Using a Thermal Plasma Scrubber" 한국청정기술학회 17 (17): 250-258, 2011

      33 I. Sokolova, "High Temperature Gas and Plasma Transport Properties of F2 and CF4 Mixtures" 174 : 213-220, 2000

      34 E. Johnson, "Global Warming from HFC" 18 : 485-492, 1998

      35 A. McCullocha, "Global Emissions of HFC-23 Estimated to Year 2015" 41 : 1560-1566, 2007

      36 C. C. Allgood, "Fluorinated Gases for Semiconductor Manufacture: Process Advances in Chemical Vapor Deposition Chamber Cleaning" 122 : 105-112, 2003

      37 W. Han, "Experimental and Chemical Kinetic Study of the Pyrolysis of Trifluoroethane and the Reaction of Trifluoromethane with Methane" 131 : 751-760, 2010

      38 G. Angelinoa, "Experimental Investigation on the Thermal Stability of Some New Zero ODP Refrigerants" 26 : 51-58, 2003

      39 E. J. Tonnis, "Evaluation of a Litmas "Blue" Point-of-Use (POU) Plasma Abatement Device for Perfluorocompound (PFC) Destruction" Technology Transfer 1998

      40 M. Mohanraj, "Environment Friendly Alternatives to Halogenated Refrigerants-A review" 3 : 108-119, 2009

      41 J. R. Fincke, "Entrainment in High-Velocity, High-Temperature Plasma Jets. Part 1: Experimental Results" 46 : 4201-4213, 2003

      42 최수석, "Effects of Constrictor Geometry, Arc Current, and Gas Flow Rate on Thermal Plasma Characteristics in a Segmented Arc Heater" JAPAN SOC MECHANICAL ENGINEERS 6 : 210-218, 2011

      43 S. Choi, "Effects of Anode Nozzle Geometry on Ambient Air Entrainment Into Thermal Plasma Jets Generated by Nontransferred Plasma Torch" 32 : 473-478, 2004

      44 T. Li, "Discharge and Optical Characteristics of Long DC Arc Plasma" 2011

      45 K. S. Kim, "Dimensional Modelling on Air Plasma Jets" 41 : 065201-, 2008

      46 K. S. Kim, "Dimensional Modeling on Arc Discharge" 15 : 023501-, 2008

      47 Narengerile, "Decomposition of Tetrafluoromethane by Water Plasma Generated under Atmospheric Pressure" 518 : 929-935, 2009

      48 박동화, "Decomposition of PFCs by steam plasma at atmospheric pressure" ELSEVIER SCIENCE SA 202 : 5280-5283, 200808

      49 Narengerile, "Decomposition Mechanism of Fluorinated Compounds in Water Plasmas Generated under Atmospheric Pressure" 30 : 813-829, 2010

      50 M. -H. Yuan, "DC Water Plasma at Atmospheric Pressure for the Treatment of Aqueous Phenol" 44 : 4710-4715, 2010

      51 S. Choi, "Comparative Study between Air and Nitrogen Thermal Plasma Process for CF4 Decomposition" 26-31, 2007

      52 M. Hur, "Comparative Analysis of Turbulent Effects on Thermal Plasma Characteristics inside the Plasma Torches with Rod- and Well-Type Cathodes" 35 : 1946-1954, 2002

      53 W. B. White, "Chemical Equilibrium in Complex Mixtures" 28 : 751-755, 1958

      54 J. F. Coudert, "Characterization of D. C. Plasma Torch Voltage Fluctuations" 16 : 211S-227S, 1996

      55 G. M. Bickle, "Catalytic Destruction of Chlorofluorocarbons and Toxic Chlorinated Hydrocarbons" 4 : 141-153, 1994

      56 박동화, "CF4 decomposition by thermal plasma processing" KOREAN INST CHEM ENGINEERS 20 : 476-481, 200305

      57 Y. Kim, "CF4 Decompositions Using Streamer- and Glow-Mode in Dielectric Barrier Discharges" 33 : 1041-1046, 2005

      58 T. Kuroki, "CF4 Decomposition of Flue Gas From Semiconductor Process Using Inductively Coupled Plasma" 41 : 221-228, 2005

      59 R. Ravishankara, "Atmospheric Lifetimes of Long-Lived Halogenated Species" 259 : 194-199, 1993

      60 K. D. Kang, "Arc Plasma Jets of a Nontransferred Plasma Torch" 24 : 89-90, 1996

      61 Narengerile, "Acetone Decompositionby Water PlasmasatAtmospheric Pressure" 69 : 296-303, 2012

      62 V. Mohindra, "Abatement of Perfluorocompounds (PFCs) in a Microwave Tubular Reactor Using O2 as an Additive Gas" 10 : 399-411, 1997

      63 M. B. Chang, "Abatement of PFCs from Semiconductor Manufacturing Processes by Nonthermal Plasma Technologies: A Critical Review" 45 : 4101-4109, 2006

      64 Y. C. Hong, "Abatement of CF4 by Atmospheric-Pressure Microwave Plasma Torch" 10 : 3410-3414, 2003

      65 W. -T. Tsai, "A Review of Uses, Environmental Hazards and Recovery/Recycle Technologies of Perfluorocarbons (PFCs) Emissions from the Semiconductor Manufacturing processes" 15 : 65-75, 2002

      66 J. V. Gompel, "A New Way to Treat Process Exhaust to Remove CF4" 20 : 95-100, 1997

      67 S. -W. Kim, "100 kW Steam Plasma Process for Treatment of PCBs (Polychlorinated Biphenyls) Waste" 70 : 59--66, 2003

      더보기

      분석정보

      View

      상세정보조회

      0

      Usage

      원문다운로드

      0

      대출신청

      0

      복사신청

      0

      EDDS신청

      0

      동일 주제 내 활용도 TOP

      더보기

      주제

      연도별 연구동향

      연도별 활용동향

      연관논문

      연구자 네트워크맵

      공동연구자 (7)

      유사연구자 (20) 활용도상위20명

      인용정보 인용지수 설명보기

      학술지 이력

      학술지 이력
      연월일 이력구분 이력상세 등재구분
      2023 평가예정 해외DB학술지평가 신청대상 (해외등재 학술지 평가)
      2020-01-01 평가 등재학술지 유지 (해외등재 학술지 평가) KCI등재
      2014-01-01 평가 SCIE 등재 (등재유지) KCI등재
      2014-01-01 평가 SCOPUS 등재 (등재유지) KCI등재
      2011-01-01 평가 등재학술지 유지 (등재유지) KCI등재
      2009-01-01 평가 등재학술지 유지 (등재유지) KCI등재
      2007-01-01 평가 등재학술지 유지 (등재유지) KCI등재
      2006-07-31 학술지명변경 한글명 : Jorunal of the Korean Nuclear Society -> Nuclear Engineering and Technology
      외국어명 : 미등록 -> Nuclear Engineering and Technology
      KCI등재후보
      2004-01-01 평가 등재후보학술지 선정 (신규평가) KCI등재후보
      2003-01-01 평가 등재후보 1차 PASS (등재후보1차) KCI등재후보
      2002-01-01 평가 등재후보학술지 유지 (등재후보1차) KCI등재후보
      1999-01-01 평가 등재후보학술지 선정 (신규평가) KCI등재후보
      더보기

      학술지 인용정보

      학술지 인용정보
      기준연도 WOS-KCI 통합IF(2년) KCIF(2년) KCIF(3년)
      2016 1.04 0.17 0.77
      KCIF(4년) KCIF(5년) 중심성지수(3년) 즉시성지수
      0.63 0.56 0.343 0.11
      더보기

      이 자료와 함께 이용한 RISS 자료

      나만을 위한 추천자료

      해외이동버튼