<P><B>A digital, direct nanoscale metal patterning method</B> is developed using femtosecond laser digital processing of metal nanoparticles for nanoscale electronics fabrication without using conventional vacuum deposition or a phot...
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https://www.riss.kr/link?id=A107751724
2011
-
SCOPUS,SCIE
학술저널
3176-3181(6쪽)
0
상세조회0
다운로드다국어 초록 (Multilingual Abstract)
<P><B>A digital, direct nanoscale metal patterning method</B> is developed using femtosecond laser digital processing of metal nanoparticles for nanoscale electronics fabrication without using conventional vacuum deposition or a phot...
<P><B>A digital, direct nanoscale metal patterning method</B> is developed using femtosecond laser digital processing of metal nanoparticles for nanoscale electronics fabrication without using conventional vacuum deposition or a photolithography mask. This method is expected to be a potential alternative to the conventional electron beam lithography method for arbitrary nanoscale direct patterning in single‐step, low‐temperature, and non‐vacuum environments.</P>
Nanoscale Semiconductor “X” on Substrate “Y” – Processes, Devices, and Applications