1 W. W. Jung, "Platinum (100) hillock growth in a Pt/Ti electrode stack for ferroelectric random access memory" 83 (83): 2160-2162, 2003
2 E. G. Colgan, "Phase formation and dissociation in the thin-film Pt/Al system" 62 (62): 1224-1231, 1987
3 S. Y. Kweon,, "Ohmic Contact Properties of Tungsten Plug and Ferroelectric Properties of (Bi,La)4Ti3O12 (BLT) thin film in stacked capacitor structure" 41 (41): 7327-7331, 2002
4 S. H. Oh, "Noble FeRAM technologies with MTP cell structure and BLT ferroelectric capacitors" December(2003)
5 S. Y. Kweon,, "Intrinsic stress dependence of Pt hillock formation and its related electrical properties of SBT capacitor" 25 : 299-309, 1999
6 P. Gas,, "Initial formation and growth of an amorphous phase in Al-Pt thin films and multilayers: Role of diffusion" 90 (90): 3899-3904, 2001
7 B. Yang, "Highly Reliable Ferroelectric Memories Using BLT Thin Films and Robust Integration Schemes" 23 (23): 743-745, 2002
8 J. Labor,P. Gas, "Formation of metastable phase during heat treatment of multilayers in the Al-Pt system" 90 (90): 6545-6547, 2001
9 Chin-An Chang, "Formation of PtSi in the presence of Al" 61 (61): 1864-1868, 1987
10 S. Y. Kweon,S. J. Yeom,S. K. Lee,Y. S. Yu,D. S. Pyun,and C. T. Kim, "Fabrication of double metal FeRAM without degradation of remanent polarization by using Ir/IrOxcapacitor contact barrier layer"" 31 : 251-259, 2000
1 W. W. Jung, "Platinum (100) hillock growth in a Pt/Ti electrode stack for ferroelectric random access memory" 83 (83): 2160-2162, 2003
2 E. G. Colgan, "Phase formation and dissociation in the thin-film Pt/Al system" 62 (62): 1224-1231, 1987
3 S. Y. Kweon,, "Ohmic Contact Properties of Tungsten Plug and Ferroelectric Properties of (Bi,La)4Ti3O12 (BLT) thin film in stacked capacitor structure" 41 (41): 7327-7331, 2002
4 S. H. Oh, "Noble FeRAM technologies with MTP cell structure and BLT ferroelectric capacitors" December(2003)
5 S. Y. Kweon,, "Intrinsic stress dependence of Pt hillock formation and its related electrical properties of SBT capacitor" 25 : 299-309, 1999
6 P. Gas,, "Initial formation and growth of an amorphous phase in Al-Pt thin films and multilayers: Role of diffusion" 90 (90): 3899-3904, 2001
7 B. Yang, "Highly Reliable Ferroelectric Memories Using BLT Thin Films and Robust Integration Schemes" 23 (23): 743-745, 2002
8 J. Labor,P. Gas, "Formation of metastable phase during heat treatment of multilayers in the Al-Pt system" 90 (90): 6545-6547, 2001
9 Chin-An Chang, "Formation of PtSi in the presence of Al" 61 (61): 1864-1868, 1987
10 S. Y. Kweon,S. J. Yeom,S. K. Lee,Y. S. Yu,D. S. Pyun,and C. T. Kim, "Fabrication of double metal FeRAM without degradation of remanent polarization by using Ir/IrOxcapacitor contact barrier layer"" 31 : 251-259, 2000
11 W. S. Yang, "Effects of crystallization annealing sequence for SrBi2Ta2O9 (SBT) film on Pt/SBT interface Morphology and electrical properties of ferroelectric capacitor" 39 (39): 5465-5468, 2000
12 Chin-An Chang, "Effect of oxygen on the diffusion of Al in Pt films" 52 (52): 4620-4622, 1987
13 H. J. Sun, "Effect of High-Temperature Metal-Organic Chemical Vapor Deposition of Pb(Zr, La)O3 Thin Film on Structural Stabilities of Hybrid Pt/IrO2/Ir Stack and Single-Layer Ir Bottom Electrodes" 43 (43): 2651-2654, 2004