Among the various direct-write (DW) techniques, aerosol jet printing (AJP) has the advantages of high resolution (~ 10 μm) and flexible working distance (2-5 mm). On this basis, it has emerged as a promising DW technology to precisely customize c...
http://chineseinput.net/에서 pinyin(병음)방식으로 중국어를 변환할 수 있습니다.
변환된 중국어를 복사하여 사용하시면 됩니다.
https://www.riss.kr/link?id=A108917258
Mingdong Li (Suzhou University) ; Zhixin Liu (Nanyang Technological University) ; Shuai Yin (Nanyang Technological University) ; Joon Phil Choi (Korea Institute of Machinery) ; Haining Zhang (Suzhou University)
2024
English
KCI등재,SCIE,SCOPUS
학술저널
71-87(17쪽)
0
상세조회0
다운로드다국어 초록 (Multilingual Abstract)
Among the various direct-write (DW) techniques, aerosol jet printing (AJP) has the advantages of high resolution (~ 10 μm) and flexible working distance (2-5 mm). On this basis, it has emerged as a promising DW technology to precisely customize c...
Among the various direct-write (DW) techniques, aerosol jet printing (AJP) has the advantages of high resolution (~ 10 μm) and flexible working distance (2-5 mm). On this basis, it has emerged as a promising DW technology to precisely customize complex electrical functional devices. However, the micro-electronic devices fabricated using AJP suffer from low electrical performance because of inferior printed line geometric characteristics. Specifically, high edge roughness lines are detrimental to the uniformity of the formed electrical functional devices. In addition, the low controllability of the printed line width may induce overlap of narrowly spaced circuits or unnecessary intertrack voids, which will hinder the wide application of AJP technology in advanced electronic manufacturing industry. Therefore, ensuring high precision of the line width and low edge roughness is of primary importance for AJP technology. In this research, a machine learning framework is proposed for rapid optimization of printed line characteristics. In the proposed framework, SHGFR and CGFR were considered as input variables, and line width and line roughness were taken as the target responses. Three representative machine learning algorithms, tree-based random forest regression, kernel-based support vector machine, and Bayesian-based Gaussian process regression, were then adopted for model development. Subsequently, the identified optimal machine learning model was integrated with a NSGA-III for rapid optimization of printed line characteristics, and experiments validated the effectiveness of the adopted approach.
Effect of Baffle Pattern Applied to Cathode Parallel Channel on PEMFC Performance