1 Lai, "microstructure of as-deposited and annealed films" 370 : 114-121, 2000.
2 Moilanen, "Utilisation of Cu tmvs precursor gas in LCVD integrated circuit repair system" 138 : 123-129, 1999.
3 Gluck, "Mechanism of carbon and oxygen incorporation into thin metal films grown by laser photolysis of carbonyls" 61 (61): 998-1005, 1987.
4 Black, "Low-Temperature laser deposition of tungsten by silane-and disilane-assisted reactions" 1072-1074, 1990.
5 Baum,T. H.,Comita,P. B, "Laser-induced chemical vapor deposition of metals for microelectronics technology" 218 : 80-94, 1992.
6 K, "Laser-assisted selective deposition of nickel patterns on porous silicon substrates" 178 : 93-97, 2001.
7 Han, "Laser-assisted chemical vapor deposition to directly write three-dimensional microstructures J. Laser Applications" 16 (16): 2004.
8 Meunier, "Laser induced deposition of tungsten and copper" 45 : pp.200-2071997.
9 Allen,S. D.,Tringubo,A. B, "Laser chemical vapor deposition of selective area Fe and W films" 54 : 1641-1643, 1983.
10 Buerle,D.,, "Laser Processing and Chemistry" Springer-Verlag 337-393, 1995.
1 Lai, "microstructure of as-deposited and annealed films" 370 : 114-121, 2000.
2 Moilanen, "Utilisation of Cu tmvs precursor gas in LCVD integrated circuit repair system" 138 : 123-129, 1999.
3 Gluck, "Mechanism of carbon and oxygen incorporation into thin metal films grown by laser photolysis of carbonyls" 61 (61): 998-1005, 1987.
4 Black, "Low-Temperature laser deposition of tungsten by silane-and disilane-assisted reactions" 1072-1074, 1990.
5 Baum,T. H.,Comita,P. B, "Laser-induced chemical vapor deposition of metals for microelectronics technology" 218 : 80-94, 1992.
6 K, "Laser-assisted selective deposition of nickel patterns on porous silicon substrates" 178 : 93-97, 2001.
7 Han, "Laser-assisted chemical vapor deposition to directly write three-dimensional microstructures J. Laser Applications" 16 (16): 2004.
8 Meunier, "Laser induced deposition of tungsten and copper" 45 : pp.200-2071997.
9 Allen,S. D.,Tringubo,A. B, "Laser chemical vapor deposition of selective area Fe and W films" 54 : 1641-1643, 1983.
10 Buerle,D.,, "Laser Processing and Chemistry" Springer-Verlag 337-393, 1995.
11 Y, "High-speed laser direct writing of tungsten conductors from W" 56 : 2581-2583, 1990.
12 Kim, "Growth characteristics of micro carbon structures fabricated by Laser-assisted Chemical Vapor Deposi ion" 19 :
13 Williams, "Freeform Fabrication of Functional Microsolenoids" 232-237, 1999.
14 Gilgen,H. H.,Cacouris,T.,Shaw,P. S.,Krchnavek,R. R, "Direct writing of metal conductors with near-uv light" 42 : 55-66, 1987.
15 Bjorklund, "Containerless fabrication of tungsten single crystals suing laser CVD for field emission applications" 75 : 493-496, 2002.