<P>Active control of plasma profiles is an essential requirement for operating within plasma stability limits, for steady-state operation and for optimization of the plasma performance. In DIII-D, plasma profiles have been actively controlled us...
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https://www.riss.kr/link?id=A107721455
Gohil, P ; Evans, T E ; Ferron, J R ; Moyer, R A ; Petty, C C ; Burrell, K H ; Casper, T A ; Garofalo, A M ; Hyatt, A W ; Jayakumar, R J ; Kessel, C ; Kim, J Y ; La Haye, R J ; Lohr, J ; Luce, T C ; Makowski, M A ; Mazon, D ; Menard, J ; Murakami, M ; Politzer, P A ; Prater, R ; Wade, M R
2006
-
SCOPUS,SCIE
학술저널
45-53(9쪽)
0
상세조회0
다운로드다국어 초록 (Multilingual Abstract)
<P>Active control of plasma profiles is an essential requirement for operating within plasma stability limits, for steady-state operation and for optimization of the plasma performance. In DIII-D, plasma profiles have been actively controlled us...
<P>Active control of plasma profiles is an essential requirement for operating within plasma stability limits, for steady-state operation and for optimization of the plasma performance. In DIII-D, plasma profiles have been actively controlled using various actuators in the following manner: (a) real time closed loop control of the <I>q</I> profile evolution using electron cyclotron heating and neutral beam injection as actuators; (b) active control of the density and pressure profiles in quiescent H-mode and quiescent double barrier plasmas using electron cyclotron current drive (ECCD) and pellet injection; (c) active control of the edge profiles to suppress edge localized modes using resonant magnetic perturbation with toroidal mode number <I>n</I> = 3, (d) real time control of the current density profile to suppress neoclassical tearing modes using localized deposition of co-ECCD.</P>