Pulse Electrodeposition of Polycrystalline Si Film in Molten CaCl₂ Containing SiO₂ Nanoparticles

다국어 초록 (Multilingual Abstract)

The high cost of Si-based solar cells remains a substantial challenge to their widespread adoption. To address this issue, it is essential to reduce the production cost of solar-grade Si, which is used as raw material. One approach to achieve this is Si electrodeposition in molten salts containing Si sources, such as SiO₂. In this study, we present the pulse electrodeposition of Si in molten CaCl₂ containing SiO₂ nanoparticles. Theoretically, SiO₂ nanoparticles with a diameter of less than 20 nm in molten CaCl₂ at 850℃ have a comparable diffusion coefficient with that of ions in aqueous solutions at room temperature. However, we observed a slower-than-expected diffusion of the SiO₂ nanoparticles, probably because of their tendency to aggregate in the molten CaCl₂. This led to the formation of a non-uniform Si film with low current efficiency during direct current electrodeposition. We overcome this issue using pulse electrodeposition, which enabled the facile supplementation of SiO₂ nanoparticles to the substrate. This approach produced a uniform and thick electrodeposited Si film. Our results demonstrate an efficient method for Si electrodeposition in molten CaCl₂ containing SiO₂ nanoparticles, which can contribute to a reduction in production cost of solar-grade Si.