Effect of O2 Partial Pressure on AlOx Thin Films Prepared by Reactive Ion Beam Sputtering Deposition

다국어 초록 (Multilingual Abstract)

The barrier and optical properties of AlOx thin films on polycarbonate deposited by reactive ion beam sputtering (RIBS) was investigated at different oxygen partial pressure. We measured the deposition rate of AlOx thin films. As the oxygen partial pressure increased, the deposition rate increased then decreased. The changes of deposition rate are associated with the properties of deposited films. The properties of deposited AlOx thin films were studied using X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM), and atomic force microscopy (AFM). Optimum deposition parameters were found for fabricating aluminum oxide thin films with high optical transparency for visible light and low oxygen transmission rate (OTR). The optical transmittance of AlOx thin film deposited on polycarbonate (PC) showed the same value of bare PC.

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