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https://www.riss.kr/link?id=O120582242
2023년
eng
0277-786X
1996-756X
학술저널
Proceedings of SPIE, the International Society for Optical Engineering
1280202-1280202 [※수록면이 p5 이하이면, Review, Columns, Editor's Note, Abstract 등일 경우가 있습니다.]
9781510668607
38th European Mask and Lithography Conference (EMLC 2023)
Dresden, Germany
0
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EUV mask defect inspection for the 3nm technology node
Divide et impera: a short talk about the importance of feature and model engineering
Efficient mask characterization through automated contour and corner rounding extraction
Image sharpness score CD-SEM CDSEM monitoring