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이 학술지의 논문 검색
Particle Nucleation and Growth: A Molecular View
Zachariah, M. R.; Carrier, M. J.; Tsang, W. Electrochemical Society 1996 p.1-8
Kematick, R. J.; Myers, C. E. Electrochemical Society 1996 p.9-15
Chemical Reactions in the CVD of Boron Nitride from BCl~3 and NH~3
Allendorf, M. D.; Osterheld, T. H. Electrochemical Society 1996 p.16-22
Kinetic and Theoretical Study of the Thermal Decomposition of Tetraethoxysilane in the Gas Phase
Satake, T.; Sorita, T.; Adachi, H. Electrochemical Society 1996 p.23-28
Reactions in SiO~2 Chemical Vapor Deposition Using Tetraethoxysilane
Ohshita, Y. Electrochemical Society 1996 p.29-34
Kinetic Modeling of SiGe Deposition with SiH~2Cl~2 and GeH~4
Hierlemann, M.; Werner, C.; Schafer, H. Electrochemical Society 1996 p.35-40
A Reaction Mechanism for Titanium Nitride CVD from TiCl~4 and NH~3
Larson, R. S.; Allendorf, M. D. Electrochemical Society 1996 p.41-46
Masi, M.; Zonca, R.; Carra, S. Electrochemical Society 1996 p.47-52
Time Reduction of Numerical Simulation for CVD Step Coverage Using DSMC Method
Tatsuta, S.; Sato, Y.; Tamaoki, N.; Egashira, Y. Electrochemical Society 1996 p.53-58
The CVD Process: Modelling Aspects
Bernard, C.; Pons, M.; Madar, R. Electrochemical Society 1996 p.59-66