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이 학술지의 논문 검색
Advanced Wet Chemical Cleaning for Future ULSI Fabrication
Ohmi, T. Electrochemical Society 1993 p.3-14
A New Cleaning Concept for Particle and Metal Removal on Si Surfaces
Meuris, M.;Verhaverbeke, S.;Mertens, P. W.;Schmidt, H. F. Electrochemical Society 1993 p.15-25
Electrochemical Equilibrium of Fe in Acid/Base/Peroxide Solutions Related to Si Wafer Cleaning
Helms, C. R.;Park, H. Electrochemical Society 1993 p.26-33
Osseo-Asare, K.;Wei, D.;Mishra, K. Electrochemical Society 1993 p.34-41
An Electrochemical Perspective of Silicon Contamination During Processing
Obeng, Y. S. Electrochemical Society 1993 p.42-49
Effects of Surface Iron on Recombination Lifetime and Its Removal from Silicon Surfaces
Park, H.;Helms, C. R.;Tran, M.;Triplett, B. B. Electrochemical Society 1993 p.50-57
The Relation Between Sodium and Aluminum Contamination and Dielectric Breakdown in MOS Structures
Vermeire, B.;Rotondaro, A. L. P.;Mertens, P. W.;Verhaverbeke, S. Electrochemical Society 1993 p.58-64
Control of Native Oxides on Deep-Submicron Contact-Hole-Bottom Surfaces
Hada, H.;Kunio, T.;Teraoka, Y.;Nishiyama, I. Electrochemical Society 1993 p.65-69
Ultra Thin Oxide Formation Using Chemical Oxide Passivation
Nakamura, K.;Futatsuki, T.;Makihara, K.;Ohmi, T. Electrochemical Society 1993 p.70-77
Peculiarities of Hot Phosphoric Acid Used in Etching Silicon Nitride
Syverson, W.;Fleming, M. Electrochemical Society 1993 p.78-84