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https://www.riss.kr/link?id=O42124529
2003년
jpn
학술저널
SEMICONDUCTORS AND INTEGRATED CIRCUITS TECHNOLOGY
34-37 [※수록면이 p5 이하이면, Review, Columns, Editor's Note, Abstract 등일 경우가 있습니다.]
Semiconductors and integrated circuits technology
64th:; SYMPOSIUM
Osaka, Japan
2003; Jun
0
상세조회0
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Mechanism of Mobility Reduction for MISFETs with high-k gate dielectrics
Electrical properties of HfO~2 films prepared by remote plasma oxidation of Hf metal
Integrating Hf-based high-k gate stacks with polysilicon gates
The emerging new memories: their characteristics and applications