TiO₂ sol solution was prepared and deposited on to SiO2 buffered Si substrate. After spin coating, annealing was performed at 400℃, 500℃ and 700℃ for 1h, respectively. X-ray diffraction (XRD) investigation was carried out to examine the struct...
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https://www.riss.kr/link?id=A82518584
2010
English
581
학술저널
126-127(2쪽)
0
상세조회0
다운로드다국어 초록 (Multilingual Abstract)
TiO₂ sol solution was prepared and deposited on to SiO2 buffered Si substrate. After spin coating, annealing was performed at 400℃, 500℃ and 700℃ for 1h, respectively. X-ray diffraction (XRD) investigation was carried out to examine the struct...
TiO₂ sol solution was prepared and deposited on to SiO2 buffered Si substrate. After spin coating, annealing was performed at 400℃, 500℃ and 700℃ for 1h, respectively. X-ray diffraction (XRD) investigation was carried out to examine the structural properties of TiO₂ thin films. Nanoimprint process was followed after spin coating of TiO₂ sol solution in order to form the nano-patterned TiO₂ layer. PDMS replica was fabricated from the Si based master template using nano-moulding technique. Scanning Electron Microscopy (SEM) was used to investigate the microstructural properties of TiO₂ nano-patterned layer of as-imprinted and annealed at 600℃. The phase formation of TiO₂ nano-pattern (600℃) was also measured by XRD.
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