Shack-Hartamann 방식 OMM(On Machine Measurement) 측정 장치 연구 = A Study on the On-Machine Measurement Device Based on the Shack-Hartmann Test

다국어 초록 (Multilingual Abstract)

Recently aspheric optics (lenses or mirrors) are widely used, however, it is more difficult to manufacture and measure compare to conventional spherical optics. The interferometric optical test is usual and precise method to measure spherical optical surface. But the interferometry is unsuitable to measure aspheric surface without precise null corrector and suffer from unstable environmental conditions such as the change of temperature and atmospheric pressure and especially from vibration.
To manufacture a precise aspheric optic part, it has been tried to correct machining error measured in machining process on the machine without detaching the workpiece from the machinetool. Therefore it is important to find adequate measurement method which is not affected from the environmental condition.
The wavefront has been reconstructed from the measured result using the primary aberration polynomial function by least square fitting. The measured result of the developed OMM apparatus gives the maximum error only in 200 nm compared to the commercial Fizeau interferometer Wyko 6000.