<P>A WSe2 field-effect transistor-based gas sensor is prepared and its gas-sensing performance is investigated. A highly n-doped silicon is used as a back-gate electrode and a WSe2 flake transferred from bulk WSe2 crystal is used as a gas-sensin...
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https://www.riss.kr/link?id=A107506671
2017
-
학술저널
3151-3154(4쪽)
0
상세조회0
다운로드다국어 초록 (Multilingual Abstract)
<P>A WSe2 field-effect transistor-based gas sensor is prepared and its gas-sensing performance is investigated. A highly n-doped silicon is used as a back-gate electrode and a WSe2 flake transferred from bulk WSe2 crystal is used as a gas-sensin...
<P>A WSe2 field-effect transistor-based gas sensor is prepared and its gas-sensing performance is investigated. A highly n-doped silicon is used as a back-gate electrode and a WSe2 flake transferred from bulk WSe2 crystal is used as a gas-sensing layer, which acts as a p-type channel. The sensing characteristics of the sensor are measured for four target gases (NO2, SO2, NH3, H2S) at 25 degrees C. At a fixed concentration of 1 ppm, drain currents are changed by 347%, 72%, 16% and 26% in NO2, NH3, SO2 and H2S, respectively. The sensing mechanisms for oxidizing (NO2 and SO2) and reducing (NH3 and H2S) gases are explained.</P>
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