Properties of Al doped ZnO (AZO) transparent conductive oxide (TCO) films were investigated for photovoltaic applications, for which AZO films were sputtered at different condition using two and four inch Al2O3:ZnO ceramic targets at mixture atmospher...
Properties of Al doped ZnO (AZO) transparent conductive oxide (TCO) films were investigated for photovoltaic applications, for which AZO films were sputtered at different condition using two and four inch Al2O3:ZnO ceramic targets at mixture atmosphere of Ar and H2.. The resistivity was decreased with decreasing sputtering pressure and the resistivity of the AZO films sputtered using two inch target was much higher than that of four inch target. An addition of hydrogen during sputtering was very effective to improve the resistivity in addition to the decrease of the resistivity of the AZO films.