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      KCI등재후보 SCOPUS

      Effect of the Coating on the Structure and Optical Properties of GaN Nanowires

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      https://www.riss.kr/link?id=A103967758

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      다국어 초록 (Multilingual Abstract)

      Structural and optical properties of as-synthesized, Ga2O3-coated, and Al2O3-coated GaN nanowires are examined in this paper. GaN nanowires were synthesized by thermal evaporation of ball-milled GaN powders in an NH3 atmosphere. The thermal annealing ...

      Structural and optical properties of as-synthesized, Ga2O3-coated, and Al2O3-coated GaN nanowires are examined in this paper. GaN nanowires were synthesized by thermal evaporation of ball-milled GaN powders in an NH3 atmosphere. The thermal annealing of the as-synthesized GaN nanowires in an argon atmosphere allows their surfaces to be oxidized, leading to the formation of 2nm-thick Ga2O3 layers. For the oxidized GaN nanowires, the distances between the neighboring lattice planes are shortened, and an excitonic emission band is remarkably enhanced in intensity, compared with the as-synthesized GaN nanowires. In addition, the as-synthesized GaN nanowires were coated cylindrically with Al2O3 by atomic layer deposition technique. Our study suggests that the Al2O3-coating passivates some of surface states in the GaN nanowires.

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      참고문헌 (Reference)

      1 "X-ray photoelectron spectroscopy and x-ray diffraction study of the thermal oxide on gallium nitride" 70 : 2156-, 1997.

      2 "Visible blind GaN p-i-n Photodiodes" 72 : 3303-, 1998.

      3 "Thermally oxidized GaN film for use as gate insulators" 19 : 579-, 2001.

      4 "Substrate dependence on the optical properties of Al2O3 films grown by atomic layer deposition" 71 : 3604-, 1997.

      5 "Study on the optoelectronic properties of amorphous selenium-based xerographic photoreceptors for electrophotography" 78 : 666-, 2003.

      6 "Preparation of alumina coatings by chemical vapour deposition" 138 : 49-, 1986.

      7 "Photoenhanced wet oxidation of gallium nitride" 76 : 511-, 2000.

      8 "Oxidation study of GaN using x-ray photoemission spectroscopy" 75 : 2602-, 1999.

      9 "Negative electron affinity and electron emission at cesiated GaN and AlN surfaces" 162 (162): 2000.

      10 "Microwave plasma oxidation of gallium nitride" 425 : 20-, 2003.

      1 "X-ray photoelectron spectroscopy and x-ray diffraction study of the thermal oxide on gallium nitride" 70 : 2156-, 1997.

      2 "Visible blind GaN p-i-n Photodiodes" 72 : 3303-, 1998.

      3 "Thermally oxidized GaN film for use as gate insulators" 19 : 579-, 2001.

      4 "Substrate dependence on the optical properties of Al2O3 films grown by atomic layer deposition" 71 : 3604-, 1997.

      5 "Study on the optoelectronic properties of amorphous selenium-based xerographic photoreceptors for electrophotography" 78 : 666-, 2003.

      6 "Preparation of alumina coatings by chemical vapour deposition" 138 : 49-, 1986.

      7 "Photoenhanced wet oxidation of gallium nitride" 76 : 511-, 2000.

      8 "Oxidation study of GaN using x-ray photoemission spectroscopy" 75 : 2602-, 1999.

      9 "Negative electron affinity and electron emission at cesiated GaN and AlN surfaces" 162 (162): 2000.

      10 "Microwave plasma oxidation of gallium nitride" 425 : 20-, 2003.

      11 "Growth of zinc oxide nanowires by thermal evaporation on vicinal Si" 249 : 201-, 2003.

      12 "GaN-free transparent ultraviolet light-emitting diodes" 82 : 1-, 2003.

      13 "Ga2O3 nanowires prepared by physical evaporation" 109 : 677-, 1999.

      14 "Ga2O3 nanomaterials synthesized from ball-milled GaN powders" 244 : 287-, 2002.

      15 "Epitaxial coreshell and coremultishell nanowire heterostructures" 420 : 57-, 2003.

      16 "Characterization of interface electronic properties of low-temperature ultrathin oxides and oxynitrides formed on Si surfaces by contactless capacitance-voltage and photoluminescence methods" 36 : 1453-, 1997.

      17 "Catalytic growth of zinc oxide nanowires by vapor transport" 13 : 113-, 2001.

      18 "Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma" 5 : 91-, 2002.

      19 "Atomic layer deposition of AlOx for thin film head gap applications" 148 : 465-, 2001.

      20 "Atomic layer deposition of Al2O3 thin films using trimethylaluminum and isopropyl alcohol" 149 : 306-, 2002.

      21 "-Ga2O3 nanowires synthesized from milled GaN powders" 80 : 479-, 2002.

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      학술지 이력

      학술지 이력
      연월일 이력구분 이력상세 등재구분
      2023 평가예정 해외DB학술지평가 신청대상 (해외등재 학술지 평가)
      2020-01-01 평가 등재학술지 유지 (해외등재 학술지 평가) KCI등재
      2011-01-01 평가 등재학술지 유지 (등재유지) KCI등재
      2009-01-01 평가 등재학술지 유지 (등재유지) KCI등재
      2006-01-01 평가 등재학술지 선정 (등재후보2차) KCI등재
      2005-05-30 학회명변경 영문명 : 미등록 -> The Korean Institute of Electrical and Electronic Material Engineers KCI등재후보
      2005-05-30 학술지명변경 한글명 : Transactions on Electrical and Electroni -> Transactions on Electrical and Electronic Materials KCI등재후보
      2005-01-01 평가 등재후보 1차 PASS (등재후보1차) KCI등재후보
      2003-01-01 평가 등재후보학술지 선정 (신규평가) KCI등재후보
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      학술지 인용정보

      학술지 인용정보
      기준연도 WOS-KCI 통합IF(2년) KCIF(2년) KCIF(3년)
      2016 0.08 0.08 0.1
      KCIF(4년) KCIF(5년) 중심성지수(3년) 즉시성지수
      0.1 0.11 0.239 0.07
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