http://chineseinput.net/에서 pinyin(병음)방식으로 중국어를 변환할 수 있습니다.
변환된 중국어를 복사하여 사용하시면 됩니다.
https://www.riss.kr/link?id=O39207574
1984년
eng
0161-6374
2576-1579
학술저널
PROCEEDINGS- ELECTROCHEMICAL SOCIETY PV
527-533 [※수록면이 p5 이하이면, Review, Columns, Editor's Note, Abstract 등일 경우가 있습니다.]
Plasma technology
Symposium; European solid state device research conference
Lille; France
1984; Sep
0
상세조회0
다운로드
Chlorine-Based Plasma Etching of Titanium Silicide Films
Prevention of Corrosion during the Reactive Ion Etch of Aluminum on TiW
A Novel Metallization Structure for Silicon and Gallium Arsenide Power Devices
Reactive Plasma-Assisted Etching of Aluminum and Aluminum Alloys