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이 학술지의 논문 검색
The Reactive Sputtering of Oxides and Nitrides
Howson, R. P. Subcommittee on Plasma Chemistry, International Union of Pure and Applied Chemistry 1993 p.783-784
Growth, Morphology and Interactions of Dust in Plasmas
Garscadden, A. Subcommittee on Plasma Chemistry, International Union of Pure and Applied Chemistry 1993 p.785-786
High Rate Deposition of Device Quality a-Si:H
Suchaneck, G.;Alhallani, B.;Steinke, B.;Wirbeleit, O. Subcommittee on Plasma Chemistry, International Union of Pure and Applied Chemistry 1993 p.787-792
Farber, Y.;Arefi, F.;Amouroux, J. Subcommittee on Plasma Chemistry, International Union of Pure and Applied Chemistry 1993 p.793-798
Microwave Plasma CVD of Silicon Oxide at Low Temperature by Using Teos
Sato, M.;Tukuda, H.;Akashi, K. Subcommittee on Plasma Chemistry, International Union of Pure and Applied Chemistry 1993 p.799-804
Uyama, H.;Kano, M. Subcommittee on Plasma Chemistry, International Union of Pure and Applied Chemistry 1993 p.805-810
Preparation of Amorphous Silicon Films by ECR Plasma CVD
Murata, M.;Takeuchi, Y. Subcommittee on Plasma Chemistry, International Union of Pure and Applied Chemistry 1993 p.811-816
Shirafuji, T.;Hayashi, Y.;Tachibana, K. Subcommittee on Plasma Chemistry, International Union of Pure and Applied Chemistry 1993 p.817-822
Investigation of the Growth Mechanism of C:H Films from An ECR Plasma
Reinke, P.;Jacob, W.;Moller, W. Subcommittee on Plasma Chemistry, International Union of Pure and Applied Chemistry 1993 p.823-828
Deposition of Silicon Oxide Film on Polymer Without Heating Using 50Hz Plasma CVD
Shimozuma, M.;Ishikawa, M.;Tagashira, M. Subcommittee on Plasma Chemistry, International Union of Pure and Applied Chemistry 1993 p.829-833