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      KCI등재 SCIE SCOPUS

      Binary Solvent Effects on Thermally Crosslinked Small Molecular Thin Films for Solution Processed Organic Light-Emitting Diodes

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      https://www.riss.kr/link?id=A107243854

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      다국어 초록 (Multilingual Abstract)

      Solution processing of crosslinkable small molecular thin films is potentially attractive for the fabrication of large-area displaypanels based on organic light-emitting diodes (OLEDs). The characteristics of a wet-processed film made of a thermallycr...

      Solution processing of crosslinkable small molecular thin films is potentially attractive for the fabrication of large-area displaypanels based on organic light-emitting diodes (OLEDs). The characteristics of a wet-processed film made of a thermallycrosslinked small-molecular material can be controlled by simply adding a cosolvent to its solution. The surface morphologyof a nanometer-scale thin film made of N4,N4′-di(naphthalen-1-yl)-N4,N4′-bis(4-vinylphenyl)biphenyl-4,4′-diamine(VNPB), dissolved in chlorobenzene, improved dramatically after the addition of 20% cyclohexanone. At the same time,better resistance of the crosslinked layer to a number of solvents frequently used in the fabrication of the adjacent emittinglayer was achieved. Moreover, the maximum current efficiency in the binary solvent device increased significantly to 22.2Cd/A, compared to 9.7 Cd/A in the reference device without VNPB, and the device lifetime was extended by up to 74.8%.
      This illustrates a simple and additive-free strategy to prevent the formation of defects in solution processed thin-film stacksmade of small-molecular materials. The insights gained will be helpful in the solution-based manufacture of large-areaOLEDs and other optoelectronic components.

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      참고문헌 (Reference)

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      학술지 이력

      학술지 이력
      연월일 이력구분 이력상세 등재구분
      학술지등록 한글명 : Electronic Materials Letters
      외국어명 : Electronic Materials Letters
      2023 평가예정 해외DB학술지평가 신청대상 (해외등재 학술지 평가)
      2020-01-01 평가 등재학술지 유지 (해외등재 학술지 평가) KCI등재
      2013-10-01 평가 등재학술지 선정 (기타) KCI등재
      2011-01-01 평가 등재후보학술지 유지 (기타) KCI등재후보
      2009-12-29 학회명변경 한글명 : 대한금속ㆍ재료학회 -> 대한금속·재료학회 KCI등재후보
      2008-01-01 평가 SCIE 등재 (신규평가) KCI등재후보
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      학술지 인용정보
      기준연도 WOS-KCI 통합IF(2년) KCIF(2년) KCIF(3년)
      2016 1.68 0.41 1.08
      KCIF(4년) KCIF(5년) 중심성지수(3년) 즉시성지수
      0.89 0.83 0.333 0.06
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