다공성 실리카와 계면활성제를 활용한 소수성 PDMS 기반 신축 가능한 저유전 필름 개발 = Development of Stretchable Low-Dielectric Film Using Hydrophobic PDMS with Porous Silica and Surfactant

다국어 초록 (Multilingual Abstract)

A stretchable low-dielectric film was developed using hydrophobic polydimethylsiloxane (PDMS) with poroussilica and surfactant. The surface property changes due to the presence or absence of the surfactant were confirmedthrough contact angle hysteresis and 3D microscopy. The dielectric properties were observed according to the content ofporous silica, and the film with a 25% content ratio showed the lowest dielectric constant. Compared to pure PDMS film,the dielectric constant decreased from 2.75 to 2.53, approximately an 8% reduction, and the dielectric loss decreased from0.045 to 0.025, approximately a 44% reduction. With the improvement in dielectric properties, the S-parameter characteristicsshowed that the S11 value improved from -13.7 dB to -22.06 dB, approximately a 61% improvement, and theS21 value improved from -3.89 dB to -2.69 dB, approximately a 31% improvement. The stretchability of PDMS withexcellent dielectric properties was up to 80%, and the tensile strain rate of the low-dielectric PDMS fabricated as a transmissionline was up to 60%. In the repeated tensile test to verify durability, resistance measurement was possible evenafter 130 repetitions at a tensile strain rate of 15%.