ECR PECVD를 이용한 LCD의 TFT용 a-si : H 박막의 증착시 마이크로파 펄스가 막의 특성에 미치는 영향 = Effects of microwave pulse on the properties of a-Si : H Thin films using ECR PECVD of the films for TFT application of LCD

다국어 초록 (Multilingual Abstract)

Hydrogenated amorphous silicon(a-Si:H) thin films have been prepared by electron cyclotron resonance plasma-enhanced chemical vapor deposition(ECR PECVD) method. Ar gas and silane gas have been used as a plasma gas and a source gas respectively. 27.51kHz and 301kHz pulses have been applied to the microwave power of the ECR PECVD for the selective-generation of SiH3 radicals which are known as most desirable radicals for the deposition of high quality a-Si:H films. It was found that the total hydrogen content, its bonding configuration and substrate temperature of a-Si:H films have been changed. The optical constants such as refractive index(n). absorption coefficient( a ), the optical energy band gap(E_(g)) of a-Si:H have been increased. Especially the present method has reduced the defect density by one order of magnitude.
These results suggest that the present method provide much higher quality a-Si:H films than the conventional ECR PECVD method. The quality of a-Si:H films deposited by this new method is as good as that of a-Si:H films deposited by radio-frequency(RF) PECVD at temperatures higher than 250℃, even though the a-Si:H films were deposited without intentional heating of the substrate. These results show a possibility that plastic substrates can be used for TFT-LCDs.(thin film transistor-liquid crystal displays)

목차 (Table of Contents)

• 제1장. 서론 = 185
• 제2장. 이론적배경 = 187
• 2.1 ECR PECVD(Electro Cyclotron Resonance Plasma Enhanced Chemical V｀apor Deposition) = 187
• 2.2 수소화된 아몰퍼스 실리콘(a-Si:H) = 193
• 2.3 AMLCD(active matrix liquid crystal displays) = 198
• 제3장. 실험방법 = 210
• 3.1 실험장비의 Set-up 및 증착조건 = 210
• 3.2 기판준비 및 a-Si:H 증착 = 210
• 제4장. ECR 플라즈마에 의한 수소화된 아몰퍼스 실리콘의 증착속도에 대한 펄스의 영향 = 213
• 제5장. ECR PECVD를 이용한 수소화된 아몰퍼스 실리콘 박막의 대면적 증착을 위한 방법 = 218
• 1. Introduction = 218
• 2. Experimental Details = 222
• 3. Results and discussion = 223
• 4. Conclusion = 225
• 제6장. ECR PECVD에 의해 증착된 수소화된 아몰퍼스 실리콘의 광학적 특성에 대한 펄스의 영향 = 235
• 제7장. 결론 = 245
• References = 246