We have proposed exposure method using Deep UV (DUV) exposure light to realize high resolution and high productivity in FPD lithography. Here, we show development concepts for our new G6 exposure tools with DUV light sources and exposure test results ...
We have proposed exposure method using Deep UV (DUV) exposure light to realize high resolution and high productivity in FPD lithography. Here, we show development concepts for our new G6 exposure tools with DUV light sources and exposure test results with a test exposure tool.
We have proposed exposure method using Deep UV (DUV) exposure light to realize high resolution and high productivity in FPD lithography. We show development concepts for our new G6 exposure tools with DUV light sources and exposure test results of 1.2 μm line and space pattern with a test exposure tool.