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      KCI등재

      고전압 용량성 결합 플라즈마 시스템의 개선된 전압 파형 출력을 위한 펄스 전류 발생장치 회로 = Current Source Type Pulse Generator with Improved Output Voltage Waveform for High Voltage Capacitively Coupled Plasma System

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      https://www.riss.kr/link?id=A106245069

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      다국어 초록 (Multilingual Abstract)

      This study proposes a current source-type pulse generator to improve output voltage and current waveforms under a capacitively coupled plasma (CCP) system. The proposed circuit comprises two parallel-connected current source-type converters. These converters can satisfy the required output waveforms of plasma processing. The parallel-connected converters operate without reverse current fault by applying a time-delay control technique. Conventional voltage source converters based on pulse power supply exhibit drawbacks in short-circuit current, and problems occur when they are applied to a CCP system. The proposed pulse power supply based on a current source converter fundamentally solves the short-circuit current problem. Therefore, this topology can improve the voltage and current accuracy of a CCP system.
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      This study proposes a current source-type pulse generator to improve output voltage and current waveforms under a capacitively coupled plasma (CCP) system. The proposed circuit comprises two parallel-connected current source-type converters. These con...

      This study proposes a current source-type pulse generator to improve output voltage and current waveforms under a capacitively coupled plasma (CCP) system. The proposed circuit comprises two parallel-connected current source-type converters. These converters can satisfy the required output waveforms of plasma processing. The parallel-connected converters operate without reverse current fault by applying a time-delay control technique. Conventional voltage source converters based on pulse power supply exhibit drawbacks in short-circuit current, and problems occur when they are applied to a CCP system. The proposed pulse power supply based on a current source converter fundamentally solves the short-circuit current problem. Therefore, this topology can improve the voltage and current accuracy of a CCP system.

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      참고문헌 (Reference)

      1 I. V. Grekhov, "Pulse power generation in nano-and subnanosecond range by means of ionizing fronts in semiconductors : The state of the art and future prospects" 38 (38): 1118-1123, 2010

      2 B. W. Koo, "Plasma diagnostics in pulsed plasma doping(P2LAD)system" 32 (32): 456-463, 2004

      3 T. Heeren, "Novel dual marx generator for microplasma applications" 33 (33): 1205-1209, 2005

      4 D. Akbar, "Investigation of single and dual RF capacitively coupled nitrogen plasma discharges using optical emission spectroscopy" 42 (42): 2058-2064, 2014

      5 P. Diomede, "Instabilities in capacitively coupled plasmas driven by asymmetric trapezoidal voltage pulses" 42 (42): 2822-2823, 2014

      6 M. D. G. Evans, "Increased flame reactivity of a lean premixed flame through the use of a custom-built high-voltage pulsed plasma source" 42 (42): 2844-2845, 2014

      7 I. Abdelsalam, "Full-bridge modular multilevel submodule-based high-voltage bipolar pulse generator with low-voltage DC, input for pulsed electric field applications" 45 (45): 2857-2864, 2017

      8 D. Wang, "Energy transfer efficiency of nano-seconds pulsed power generator for nonthermal plasma processing technique" 18 (18): 1091-1096, 2011

      9 W. Shin, "Bidirectional pulse plasma power supply for treatment of air pollution" 1-6, 2006

      10 M. A. Elgenedy, "A modular multilevel generic pulse-waveform generator for pulsed electric field applications" 45 (45): 2527-2535, 2017

      1 I. V. Grekhov, "Pulse power generation in nano-and subnanosecond range by means of ionizing fronts in semiconductors : The state of the art and future prospects" 38 (38): 1118-1123, 2010

      2 B. W. Koo, "Plasma diagnostics in pulsed plasma doping(P2LAD)system" 32 (32): 456-463, 2004

      3 T. Heeren, "Novel dual marx generator for microplasma applications" 33 (33): 1205-1209, 2005

      4 D. Akbar, "Investigation of single and dual RF capacitively coupled nitrogen plasma discharges using optical emission spectroscopy" 42 (42): 2058-2064, 2014

      5 P. Diomede, "Instabilities in capacitively coupled plasmas driven by asymmetric trapezoidal voltage pulses" 42 (42): 2822-2823, 2014

      6 M. D. G. Evans, "Increased flame reactivity of a lean premixed flame through the use of a custom-built high-voltage pulsed plasma source" 42 (42): 2844-2845, 2014

      7 I. Abdelsalam, "Full-bridge modular multilevel submodule-based high-voltage bipolar pulse generator with low-voltage DC, input for pulsed electric field applications" 45 (45): 2857-2864, 2017

      8 D. Wang, "Energy transfer efficiency of nano-seconds pulsed power generator for nonthermal plasma processing technique" 18 (18): 1091-1096, 2011

      9 W. Shin, "Bidirectional pulse plasma power supply for treatment of air pollution" 1-6, 2006

      10 M. A. Elgenedy, "A modular multilevel generic pulse-waveform generator for pulsed electric field applications" 45 (45): 2527-2535, 2017

      11 X. Bonnin, "A high voltage high frequency resonant inverter for supplying DBD devices with short discharge current pulses" 29 (29): 4261-4269, 2014

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      학술지 이력

      학술지 이력
      연월일 이력구분 이력상세 등재구분
      2027 평가예정 재인증평가 신청대상 (재인증)
      2021-01-01 평가 등재학술지 유지 (재인증) KCI등재
      2018-01-01 평가 등재학술지 유지 (등재유지) KCI등재
      2015-01-01 평가 등재학술지 유지 (등재유지) KCI등재
      2011-01-01 평가 등재학술지 유지 (등재유지) KCI등재
      2009-01-01 평가 등재학술지 유지 (등재유지) KCI등재
      2007-01-01 평가 등재학술지 유지 (등재유지) KCI등재
      2005-01-01 평가 등재학술지 유지 (등재유지) KCI등재
      2002-07-01 평가 등재학술지 선정 (등재후보2차) KCI등재
      2000-01-01 평가 등재후보학술지 선정 (신규평가) KCI등재후보
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      학술지 인용정보

      학술지 인용정보
      기준연도 WOS-KCI 통합IF(2년) KCIF(2년) KCIF(3년)
      2016 0.17 0.17 0.2
      KCIF(4년) KCIF(5년) 중심성지수(3년) 즉시성지수
      0.21 0.23 0.361 0.06
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