<B>Graphic Abstract</B> <P>Critical issues that occur during the fabrication of high-density nanostructures by e-beam lithography are considered. A 25-nm-pitch Si nanopillar array and a 15-nm-pitch resist nanodot array are fabrica...
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https://www.riss.kr/link?id=A107639449
2008
-
SCOPUS,SCIE
학술저널
2118-2122(5쪽)
0
상세조회0
다운로드다국어 초록 (Multilingual Abstract)
<B>Graphic Abstract</B> <P>Critical issues that occur during the fabrication of high-density nanostructures by e-beam lithography are considered. A 25-nm-pitch Si nanopillar array and a 15-nm-pitch resist nanodot array are fabrica...
<B>Graphic Abstract</B>
<P>Critical issues that occur during the fabrication of high-density nanostructures by e-beam lithography are considered. A 25-nm-pitch Si nanopillar array and a 15-nm-pitch resist nanodot array are fabricated. Transfer of 1 teradot inch<SUP>−2</SUP> patterns from the nanopillar array to a polymer surface is carried out by nanoimprint lithography (see picture).
<img src='wiley_img/16136810-2008-4-12-SMLL200800625-content.gif' alt='wiley_img/16136810-2008-4-12-SMLL200800625-content'>
</P>
Biomimetic Soft Multifunctional Miniature Aquabots