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https://www.riss.kr/link?id=O16760057
1997년
-
0734-2101
1520-8559
SCI;SCIE;SCOPUS
학술저널
JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A VACUUMS SURFACES AND FILMS
2148-2152 [※수록면이 p5 이하이면, Review, Columns, Editor's Note, Abstract 등일 경우가 있습니다.]
0
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Role of N~2 addition on CF~4/O~2 remote plasma chemical dry etching of polycrystalline silicon
Flexible fluorocarbon wire coatings by pulsed plasma enhanced chemical vapor deposition
Growth of very low temperature polysilicon film by remote plasma-enhanced chemical-vapor deposition
Highly oriented rutile-type TiO~2 films synthesized by ion beam enhanced deposition