PDMS기판의 플라즈마 처리 조건이 구리 무전해도금 공정에 미치는 영향

다국어 초록 (Multilingual Abstract)

The substrate transform using polydimethylsiloxane (PDMS) is a tool for providing Si substrate with flexible and transparent properties. In this study, an appropriate manufacturing process experiment was conducted to alter the existing silicon material into a PDMS material. The manufacturing process used plasma and electroless plating processes, and the contact angle and pixel analyses were conducted experimentally. Because the plasma process generates residual stresses on the PDMS surface and cracks the plated metal thin film, we determined the most suitable process model to avoid these issues. Moreover, we considered modifying the appropriate process model according to the catalyst application time. Therefore, this study expresses the applicability of metal electroless plating through various variables.

목차 (Table of Contents)

• ABSTRACT
• 1. 서론
• 2. 실험과정
• 3. 실험결과 및 고찰
• 4. 결론
• REFERENCES