In this paper, energy distribution function in SiH₄ has been analysed over the E/N range 0.5~300Td and Pressure value 0.5, 1.0. 2.5 Torr by a two-term approximation Boltzmann equation method and by a Monte Carlo simulation. The motion has been ca...

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https://www.riss.kr/link?id=A82287229
2006
Korean
560
학술저널
159-162(4쪽)
0
상세조회0
다운로드다국어 초록 (Multilingual Abstract)
In this paper, energy distribution function in SiH₄ has been analysed over the E/N range 0.5~300Td and Pressure value 0.5, 1.0. 2.5 Torr by a two-term approximation Boltzmann equation method and by a Monte Carlo simulation. The motion has been ca...
In this paper, energy distribution function in SiH₄ has been analysed over the E/N range 0.5~300Td and Pressure value 0.5, 1.0. 2.5 Torr by a two-term approximation Boltzmann equation method and by a Monte Carlo simulation.
The motion has been calculated to give swarm parameters for the electron drift velocity, diffusion coefficient. electron ionization, mean energy and the electron energy distribution function. The electron energy distribution function has been analysed in SiH₄ at E/N = 30, 50Td for a case of the equilibrium region in the mean electron energy and respective set of electron collision cross sections.
The results show that the deduced electron drift velocities, the electron ionization or attachment coefficients, longitudinal and transverse diffusion coefficients and mean energy agree reasonably well with theoretical for a rang of E/N values.
목차 (Table of Contents)
압전 프린트헤드의 잉크드롭 최적형성을 위한 각 노즐제어
Flexible AM-OLED를 위한 OTFT 기술 기반의 MIS 구조 C-V 특성 분석
Floating p-well 전압 감지 방법과 수평형 절연 게이트 바이폴라 트랜지스터(LIGBT)를 이용한 새로운 1200V 절연 게이트 바이폴라 트랜지스터(IGBT)의 보호회로