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Design of Single Wafer Future Logic Fabs
Castrucci, P.; Griffen, J.; Williams, M. M. IEEE 1994 p.1-6
Performance, Process Architecture, and Tooling Considerations for Advanced Semiconductor Wafer Fabs
Slaby, C. P.; Baker, G.; Castrucci, P. IEEE 1994 p.7-9
Mini Environment Systems, Enabling Technology for Flexible Fabs of the Future (abstract)
Baldwin, K.; Castrucci, P.; Williams, M. IEEE 1994 p.10
Art, D.; O'Halloran, M. IEEE 1994 p.16-21
Semiconductor Manufacturing: Future Process Challenges (abstract)
Bakeman, P. E. IEEE 1994 p.26
Plasma Process Integration for Large Wafer Manufacturing (abstract)
Rollinger, I. D.; Gardopee, G. J.; Mathur, D. P.; Mumola, P. B. IEEE 1994 p.27
Control of Interfacial Oxide Using a Novel Cluster Tool Technology
Frystak, D. C.; Albone, J.; Rumaine, P. IEEE 1994 p.28-33
Process Transfer from Conventional RIE to Transformer-Coupled High Density Plasma Metal Etch System
Christie, R.; Johnston, S.; Kutchmarick, D.; Barlow, J. IEEE 1994 p.34-36