http://chineseinput.net/에서 pinyin(병음)방식으로 중국어를 변환할 수 있습니다.
변환된 중국어를 복사하여 사용하시면 됩니다.
https://www.riss.kr/link?id=O50024257
Borst, C. ; Huli, L. ; Bennett, S. ; Dai, H. ; Bencher, C. ; Chen, Y.
2007년
eng
학술저널
ADVANCED METALLIZATION CONFERENCE IN
403-410 [※수록면이 p5 이하이면, Review, Columns, Editor's Note, Abstract 등일 경우가 있습니다.]
9781558999923
Advanced metallization conference
Albany, NY
2007; Oct
0
상세조회0
다운로드
Possibilities and Problems of Self-Forming Barrier Process for Advanced LSI Metallization
A Surface Adsorption Limited Model of CoWBP Capping Barriers for sub 45 nm Cu Interconnects
Hybrid CoWP/SiCN Barriers Integration Using Hybrid Punch Through Approach
Copper and Copper Oxide Composite Films Deposited by ALD on Tantalum-Based Diffusion Barriers