<P>Metal catalyst-free growth of large scale single layer graphene film on a sapphire substrate by a chemical vapor deposition (CVD) process at 950 °C is demonstrated. A top-gated graphene field effect transistor (FET) device is successfull...
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https://www.riss.kr/link?id=A107758676
2012
-
SCOPUS,SCIE
학술저널
3050
0
상세조회0
다운로드다국어 초록 (Multilingual Abstract)
<P>Metal catalyst-free growth of large scale single layer graphene film on a sapphire substrate by a chemical vapor deposition (CVD) process at 950 °C is demonstrated. A top-gated graphene field effect transistor (FET) device is successfull...
<P>Metal catalyst-free growth of large scale single layer graphene film on a sapphire substrate by a chemical vapor deposition (CVD) process at 950 °C is demonstrated. A top-gated graphene field effect transistor (FET) device is successfully fabricated without any transfer process. The detailed growth process is investigated by the atomic force microscopy (AFM) studies.</P>
Scanning ion conductance microscopy studies of amyloid fibrils at nanoscale.