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https://www.riss.kr/link?id=O38986508
1998년
eng
2166-2746
2166-2754
SCIE
학술저널
JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY B MICROELECTRONICS AND NANOMETER STRUCTURE
3398-3404 [※수록면이 p5 이하이면, Review, Columns, Editor's Note, Abstract 등일 경우가 있습니다.]
Electron, ion, and photon beam technology and nanofabrication
International conference; 42nd
Chicago; IL
1998; May
0
상세조회0
다운로드
Advanced synchrotron radiation stepper alignment system performance
Nanometer scattered-light alignment system using SiC x-ray masks with low optical transparency
Wafer chuck for magnification correction in x-ray lithography
Mask membrane deflection caused by mask tilt during the wafer stepping motion in x-ray steppers