Formation of Iron-oxide Nanorods on the Surface of Silicon by Using Annealing Technique

다국어 초록 (Multilingual Abstract)

In this article, we report the synthesis of iron-oxide nanorods on silicon (Si) substrates. The nanorods were formed by annealing an iron chloride solution on the surface of a Si at 950 C in the presence of a reducing gas (H2) and a diluting gas (Ar). The surface morphologies of the nanorods were investigated by using field-emission scanning electron microscopy, and their compositions and structural characterization were investigated by elemental using energy dispersive X-ray spectroscopy and high-resolution transmission electron microscopy (HRTEM), respectively.
The HRTEM study shows a crystalline formation of the nanorods. The electron diffraction pattern along the viewing (111) direction and the HRTEM result shows an interplanar distance equal to 2.17 °A, which is nearly equal to the standard value 2.3 °A of FeO. The as-fabricated nanorods can be used for many technological applications.

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